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ADVANCED METALLISATION METHODS FOR MONOCRYSTALLINE SILICON WAFER SOLAR CELLS

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ADVANCED METALLISATION METHODS FOR MONOCRYSTALLINE SILICON WAFER SOLAR CELLS ANKIT KHANNA (M.Tech., Indian Institute of Technology, Varanasi) A THESIS SUBMITTED FOR THE DEGREE OF DOCTOR OF PHILIOSOPHY DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING NATIONAL UNIVERSITY OF SINGAPORE 2015 Declaration I hereby declare that this thesis is my original work and it has been written by me in its entirety. I have duly acknowledged all the sources of information which have been used in the thesis. This thesis has also not been submitted for any degree in any university previously. Ankit KHANNA 15th July 2015 Acknowledgements I would like to take this opportunity to thank several people and organisations who have helped me during my PhD candidature. First of all, I would like to express my sincere gratitude to my supervisor Prof. Armin Aberle for giving me the opportunity to pursue a PhD in silicon photovoltaics at the Solar Energy Research Institute of Singapore (SERIS) as well as for his expert guidance throughout my PhD candidature. I am indebted to my co-supervisor, Dr. Thomas Mueller for his role as my day-to-day scientific advisor. Thank you Thomas for your support, ideas and guidance. Thank you also for organising funding for my research attachment and travel to conferences. I would also like to thank the Department of Electrical and Computer Engineering (ECE) at the National University of Singapore (NUS) for a PhD scholarship. I am thankful to Dr. Bram Hoex, Dr Prabir Kanti Basu, Dr. Rolf Stangl and Dr. Johnson Wong for their contributions to my work: Bram for his role in mentoring PhD students at SERIS through the PhD students meeting and other periodic interactions, Basu for helping me understand various industrial aspects of silicon wafer solar cells, Rolf for introducing me to advanced solar cell modelling, and Johnson for several enlightening discussions. I carried out the latter part of my PhD research at the Fraunhofer Institute for Solar Energy Systems (Fraunhofer ISE) as part of a research attachment. I would like to acknowledge funding for the research attachment provided by the National Research Foundation, Prime Minister’s Office, Singapore under its Clean Energy Research Programme (CERP Award No. NRF2010EWT-CERP001-022). I am grateful to i Dr. Stefan Glunz and Dr. Markus Glatthaar for hosting me at Fraunhofer ISE for a research attachment. I am also very thankful to Christian Schmiga for supervising my work at Fraunhofer ISE. I would like to thank several work colleagues for their contributions to my work and for creating a cordial work environment. Thank you Vinodh Shanmugam, Dr. Zhi Peng Ling, Dr. Shubham Duttagupta, Dr. Ge Jia, Naomi Nandakumar, Kishan Shetty, Avishek Kumar, Ranjani Sridharan, Jai Prakash Singh, Dr. Jiaying Ye, Dr. Ziv Hameiri, Pooja Chaturvedi, Philipp Steutzel, Jessen Cunnusamy, Dr. Licheng Liu, Samuel Raj, Ann Roberts, Jason Avancena, Edwin Carmona, Allan Ferdinand (affable colleagues I met at SERIS); Aleksander Filipovic, Dr. Andre Kalio, KurtUlrich Ritzau, Mathias Kamp, Dr. Jonas Bartsch, Elisabeth Schäffer, Arthur Kremer, Steve Olweya, Sebastian Binder, Aline Gautrein, Dr. Michael Rauer, Annika Tuschinsky, Katja Krüger, Karin Zimmermann, Gisela Cimmioti, Rainer Neubauer, Felix Schätzle, Antonio Leimenstoll, Michael Linse, Marc Retzlaff, Tim Niewelt, Daniele Palaferri, Ino Geisemeyer, Heiko Steinkemper, Torge Behrendt, Maik Simon, Julian Schrof, Siddharth Modi (affable colleagues I met at Fraunhofer ISE); and Dr. Martin Heinrich (an affable colleague at both SERIS and Fraunhofer ISE). I am also thankful that many of you were generous with your time outside of work and that we became good friends. Last but not least, a “shout-out” also to three close friends, outside of work, in Singapore and Germany: my beautiful and warm-hearted girlfriend Thi Ha Nguyen, my humble banker friend Veesam Nagarjuna, and my workaholic friend Dr. (med) Constantin Anastasopoulos who epitomises that a very busy work life and a fulfilling social life can co-exist. ii Contents Abstract . vi List of tables viii List of figures ix List of symbols xiii List of abbreviations xvi Introduction .1 1.1 Thesis motivation 1.2 Scientific and technical issues addressed in this thesis . 1.3 Thesis outline Background and literature review .8 2.1 Operating principles of silicon wafer solar cells . 2.2 Current-voltage characteristics . 11 2.3 Fabrication 12 2.3.1 Homojunction silicon wafer solar cells 12 2.3.2 Heterojunction silicon wafer solar cells . 15 2.4 Characterisation techniques 19 2.4.1 Current-voltage measurement 19 2.4.2 Spectral response 20 2.4.3 Suns-𝑉𝑜𝑐 . 21 2.4.4 Contact resistance measurement 22 2.4.5 Scanning electron microscopy . 25 2.4.6 Energy dispersive X-ray spectroscopy . 26 2.4.7 Statistical surface profiling 27 2.4.8 Electrochemical capacitance-voltage profiling 29 2.4.9 Photoluminescence and electroluminescence 30 2.5 Theoretical metal-semiconductor contact models . 31 2.6 Metallisation technologies for silicon wafer solar cells 37 2.6.1 Metal evaporation 37 2.6.2 Metal printing . 38 2.6.3 Electrochemical metallisation 41 iii Development of a fill factor loss analysis method for silicon wafer solar cells . 43 3.1 Introduction . 43 3.2 Fill factor loss analysis method . 46 3.2.1 Upper limit of fill factor . 46 3.2.2 Quantification of loss mechanisms 47 3.3 Error analysis 48 3.4 Examples of application of the method . 53 3.4.1 Inline-diffused p-type silicon wafer cell 53 3.4.2 Heterojunction silicon wafer solar cell 59 3.5 Discussion of injection-dependent effects 62 3.6 Chapter summary 63 Investigation of the influence of random pyramid surface texture on silver screen-printed contact formation for homojunction silicon wafer solar cells . 65 4.1 Introduction . 65 4.2 Experiment 67 4.3 Statistical characterisation of pyramid height distributions 71 4.4 Investigation of contact microstructure . 73 4.4.1 Contact microstructure overview . 73 4.4.2 Influence of texture height/pyramid density 76 4.4.3 Influence of pyramidal texture uniformity . 80 4.5 Guidelines to tailor pyramid height distributions 84 4.6 Chapter summary 85 Experimental analysis of silver light-induced plating for homojunction silicon wafer solar cells . 87 5.1 Introduction . 87 5.2 Contacting lightly doped silicon regions 88 5.3 Influence of silver light-induced plating on contact resistance . 90 5.3.1 Phosphorus-diffused silicon . 90 5.3.2 Phosphorus ion-implanted silicon 93 5.4 Solar cell results 95 5.5 Chapter summary 99 iv Experimental analysis of silver screen printing for heterojunction silicon wafer solar cells 100 6.1 Introduction . 100 6.2 Characterisation of TCO contacting pastes . 103 6.2.1 Contact formation to AZO layers . 103 6.2.2 Annealing behaviour of TCO contacting pastes 105 6.3 Calculated paste-related series resistance components . 108 6.4 Solar cell results 109 6.4.1 Loss mechanisms of fabricated cells 111 6.5 Chapter summary 113 Experimental analysis of copper electroplating for heterojunction silicon wafer solar cells 115 7.1 Introduction . 115 7.2 Transparent conductive oxide layer masking 116 7.2.1 Screen-printed masking 116 7.2.2 Laser-patterned masking 124 7.3 Solar cell results 128 7.4 Chapter summary 132 Conclusions, contributions and future research 134 8.1 Conclusions . 134 8.2 Author’s original contributions . 136 8.3 Proposed future research . 138 8.3.1 Extended fill factor loss analysis 138 8.3.2 Further development of large-area heterojunction cells . 138 8.3.3 Reliability of copper metallised heterojunction cells . 139 Appendix . 141 References . 143 List of publications 158 v Abstract This thesis focuses on the application and characterisation of screen printing and electrochemical (plating) technologies for silicon wafer solar cell metallisation. The metallisation technologies are applied to silicon homojunction and amorphous silicon/crystalline silicon heterojunction solar cells fabricated on monocrystalline silicon wafers. For silicon wafer solar cells it is extremely important to achieve high fill factors to maximize the power generation capabilities of the cell. Metallisation processes have a significant influence on a solar cell’s fill factor. Therefore, a method is developed to quantify fill factor losses due to ohmic and recombination loss mechanisms. The method is demonstrated on both silicon homojunction and heterojunction solar cells. Industrial monocrystalline silicon wafer solar cells are alkaline textured on at least the illuminated surface and the resultant random-pyramid surface texture has a significant influence on metal contact formation. A comprehensive experimental study is carried out to investigate this influence for screen-printed silver contacts to phosphorusdiffused silicon. The study involves correlating statistics of pyramid height distribution to the cells’ electrical parameters and the microstructure of the metallised interfaces. Based on the study, guidelines are developed to optimise silver screenprinted contacts to phosphorus-diffused silicon by tailoring the surface texture. Silver screen-printed contact formation to phosphorus-doped silicon regions requires higher doping than the corresponding requirement for evaporated metallisation. However, highly doped illuminated regions are undesirable for silicon wafer solar cells as they limit the cells’ short-circuit current and open-circuit voltage. To overcome this limitation, silver light-induced plating is applied to improve screen- vi and behavior of passivation layers," Journal of The Electrochemical Society, vol. 137, pp. 3612-3626, 1990. [16] D. L. King and M. E. Buck, "Experimental optimization of an anisotropic etching process for random texturization of silicon solar cells," in Proc. 22nd IEEE Photovoltaic Specialists Conference, 1991, pp. 303-308. [17] P. Campbell and M. A. Green, "Light trapping properties of pyramidally textured surfaces," Journal of Applied Physics, vol. 62, pp. 243-249, 1987. [18] W. Kern, "The evolution of silicon wafer cleaning technology," Journal of The Electrochemical Society, vol. 137, pp. 1887-1892, 1990. [19] P. K. Basu, A. Khanna, and Z. Hameiri, "The effect of front pyramid heights on the efficiency of homogeneously textured inline-diffused screen-printed monocrystalline silicon wafer solar cells," Renewable Energy, vol. 78, pp. 590–598, 2015. [20] M. Rauer, C. Schmiga, R. Woehl, K. Ruhle, M. Hermle, Ho, et al., "Investigation of aluminum-alloyed local contacts for rear surface-passivated silicon solar cells," IEEE Journal of Photovoltaics, vol. 1, pp. 22-28, 2011. [21] A. Mette, C. Schetter, D. Wissen, S. Lust, S. W. Glunz, and G. Willeke, "Increasing the efficiency of screen-printed silicon solar cells by lightinduced silver plating," in Proc. 4th World Conference on Photovoltaic Energy Conversion, 2006, pp. 1056-1059. [22] T. Mishima, M. Taguchi, H. Sakata, and E. Maruyama, "Development status of high-efficiency HIT solar cells," Solar Energy Materials and Solar Cells, vol. 95, pp. 18-21, 2011. [23] D. Batzner, Y. Andrault, L. Andreetta, A. Buechel, C. Frammelsberger, C. Guerin, et al., "Characterisation of over 21% efficient silicon heterojunction cells developed at Roth & Rau Switzerland," in Proc. 26th European Photovoltaic Solar Energy Conference, Hamburg, Germany, 2011, pp. 1073 1075. [24] A. Descoeudres, L. Barraud, S. De Wolf, B. Strahm, D. Lachenal, C. Guerin, et al., "Improved amorphous/crystalline silicon interface passivation by hydrogen plasma treatment," Applied Physics Letters, vol. 99, p. 123506, 2011. [25] D. Muñoz, T. Desrues, A.-S. Ozanne, N. Nguyen, S. De Vecchi, F. Souche, et al., "Progress on high efficiency standard and interdigitated back contact silicon heterojunction solar cells," in Proc. 26th European Photovoltaic Solar Energy Conference, Hamburg, 2011, pp. 861-864. [26] J.-H. Choi, S.-K. Kim, J.-C. Lee, H. Park, W.-J. Lee, and E.-C. Cho, "Advanced module fabrication of silicon heterojunction solar cells using anisotropic conductive film method," in Proc. 26th European Photovoltaic Solar Energy Conference, Hamburg, 2011, pp. 3302-3304. [27] T. Mueller, J. Wong, and A. G. Aberle, "Heterojunction Silicon Wafer Solar Cells using Amorphous Silicon Suboxides for Interface Passivation," Energy Procedia, vol. 15, pp. 97-106, 2012. 144 [28] M. Taguchi, A. Yano, S. Tohoda, K. Matsuyama, Y. Nakamura, T. Nishiwaki, et al., "24.7% record efficiency HIT solar cell on thin silicon wafer," IEEE Journal of Photovoltaics, vol. 4, pp. 96-99, 2014. [29] K. Masuko, M. Shigematsu, T. Hashiguchi, D. Fujishima, M. Kai, N. Yoshimura, et al., "Achievement of more than 25% conversion efficiency with crystalline silicon heterojunction solar cell," IEEE Journal of Photovoltaics, vol. 4, pp. 1433-1435, 2014. [30] W. van Sark, L. Korte, and F. Roca, Physics and technology of amorphouscrystalline heterostructure silicon solar cells, Springer, 2011. [31] M. Filipic, Z. C. Holman, F. Smole, S. De Wolf, C. Ballif, and M. Topic, "Analysis of lateral transport through the inversion layer in amorphous silicon/crystalline silicon heterojunction solar cells," Journal of Applied Physics, vol. 114, p. 074504, 2013. [32] R. S. Crandall, E. Iwaniczko, J. V. Li, and M. R. Page, "A comprehensive study of hole collection in heterojunction solar cells," Journal of Applied Physics, vol. 112, p. 093713, 2012. [33] T. Mueller, Heterojunction solar cells (a-Si/c-Si): investigations on PECV deposited hydrogenated silicon alloys for use as high-quality surface passivation and emitter/BSF, Logos Verlag Berlin GmbH, 2009. [34] A. Descoeudres, Z. C. Holman, L. Barraud, S. Morel, S. De Wolf, and C. Ballif, "> 21% efficient silicon heterojunction solar cells on n-and p-type wafers compared," IEEE Journal of Photovoltaics, vol. 3, pp. 83-89, 2013. [35] Z. C. Holman, A. Descoeudres, L. Barraud, F. Z. Fernandez, J. P. Seif, S. De Wolf, et al., "Current losses at the front of silicon heterojunction solar cells," IEEE Journal of Photovoltaics, vol. 2, pp. 7-15, 2012. [36] H. Fujiwara and M. Kondo, "Effects of a‐Si:H layer thicknesses on the performance of a‐Si:H∕c‐Si heterojunction solar cells," Journal of Applied Physics, vol. 101, p. 054516, 2007. [37] Z. C. Holman, A. Descoeudres, S. De Wolf, and C. Ballif, "Record infrared internal quantum efficiency in silicon heterojunction solar cells with dielectric/metal rear reflectors," IEEE Journal of Photovoltaics, vol. 3, pp. 1243-1249, 2013. [38] J. L. Hernández, D. Adachi, K. Yoshikawa, D. Schroos, E. Van Assche, A. Feltrin, et al., "High efficiency copper electroplated heterojunction solar cells," in Proc. 27th European PV Solar Energy Conference, Frankfurt, 2012, pp. 655-656. [39] A. G. Aberle, S. R. Wenham, and M. A. Green, "A new method for accurate measurements of the lumped series resistance of solar cells," in Proc. 23 rd IEEE Photovoltaic Specialists Conference, 1993, pp. 133-139. [40] A. G. Aberle, W. Zhang, and B. Hoex, "Advanced loss analysis method for silicon wafer solar cells," Energy Procedia, vol. 8, pp. 244-249, 2011. 145 [41] R. Sinton and A. Cuevas, "A quasi-steady-state open-circuit voltage method for solar cell characterization," in Proc. 16th European Photovoltaic Solar Energy Conference, Glasgow, 2000, pp. 1152-1155. [42] M. Wolf and H. Rauschenbach, "Series resistance effects on solar cell measurements," Advanced Energy Conversion, vol. 3, pp. 455-479, 1963. [43] D. K. Schroder, Semiconductor Material and Device Characterization, John Wiley & Sons, 2006. [44] L. K. Mak, C. M. Rogers, and D. C. Northrop, "Specific contact resistance measurements on semiconductors," Journal of Physics E: Scientific Instruments, vol. 22, p. 317, 1989. [45] G. K. Reeves, "Specific contact resistance using a circular transmission line model," Solid-State Electronics, vol. 23, pp. 487-490, 1980. [46] J. I. Goldstein, D. E. Newbury, D. C. Joy, C. Lyman, P. Echlin, E. Lifshin, et al., Scanning electron microscopy and X-ray microanalysis, Springer, 2003. [47] K. D. Vernon-Parry, "Scanning electron microscopy: an introduction," III-Vs Review, vol. 13, pp. 40-44, 2000. [48] D. C. Joy and D. G. Howitt, "Scanning Electron Microscopy," in Encyclopedia of Physical Science and Technology (Third Edition), R. A. Meyers, Ed., ed New York: Academic Press, 2003, pp. 457-467. [49] G. E. Lloyd, "Atomic number and crystallographic contrast images with the SEM: a review of backscattered electron techniques," Mineralogical Magazine, vol. 51, pp. 3-19, 1987. [50] T. Everhart and P. Hoff, "Determination of kilovolt electron energy dissipation vs penetration distance in solid materials," Journal of Applied Physics, vol. 42, pp. 5837-5846, 1971. [51] D. Drouin, A. R. Couture, D. Joly, X. Tastet, V. Aimez, and R. Gauvin, "CASINO V2. 42-A fast and easy‐to‐use modeling tool for scanning electron microscopy and microanalysis users," Scanning, vol. 29, pp. 92-101, 2007. [52] E. Wefringhaus, C. Kesnar, and M. Löhmann, "Statistical approach to the description of random pyramid surfaces using 3D surface profiles," Energy Procedia, vol. 8, pp. 135-140, 2011. [53] V. Velidandla, X. Jim, H. Zhen, K. Wijekoon, and D. Tanner, "Texture process monitoring in solar cell manufacturing using optical metrology," in Proc. 37th IEEE Photovoltaic Specialists Conference, Seattle, 2011, pp. 17441747. [54] K. Birmann, M. Demant, and S. Rein, "Optical characterization of random pyramid texturization," in Proc. 26th European Photovoltaic Solar Energy Conference, Hamburg, 2011, pp. 1454-1458. [55] M. Löhmann and E. Wefringhaus, "Microscopic parameters to describe homogeneity of alkaline texture on Si-wafers," Energy Procedia, vol. 38, pp. 849-854, 2013. 146 [56] T. Ambridge and M. M. Faktor, "An automatic carrier concentration profile plotter using an electrochemical technique," Journal of Applied Electrochemistry, vol. 5, pp. 319-328, 1975. [57] W. Schottky, "Simplified and extended theory of boundary-layer rectifiers (in German, original title: Vereinfachte und erweitere Theorie der Randschichtgleichrichter)," Zeitschrift fur Physik, vol. 118, pp. 539-592, 1942. [58] P. Blood, "Capacitance-voltage profiling and the characterisation of III-V semiconductors using electrolyte barriers," Semiconductor Science and Technology, vol. 1, p. 7, 1986. [59] D. K. Schroder, "Carrier lifetimes in silicon," IEEE Transactions on Electron Devices, vol. 44, pp. 160-170, 1997. [60] T. Fuyuki, H. Kondo, T. Yamazaki, Y. Takahashi, and Y. Uraoka, "Photographic surveying of minority carrier diffusion length in polycrystalline silicon solar cells by electroluminescence," Applied Physics Letters, vol. 86, p. 262108, 2005. [61] P. Würfel, T. Trupke, T. Puzzer, E. Schäffer, W. Warta, and S. W. Glunz, "Diffusion lengths of silicon solar cells from luminescence images," Journal of Applied Physics, vol. 101, p. 123110, 2007. [62] J. Haunschild, I. E. Reis, J. Geilker, and S. Rein, "Detecting efficiencylimiting defects in Czochralski-grown silicon wafers in solar cell production using photoluminescence imaging," physica status solidi (RRL) - Rapid Research Letters, vol. 5, pp. 199-201, 2011. [63] J. A. Giesecke, M. C. Schubert, B. Michl, F. Schindler, and W. Warta, "Minority carrier lifetime imaging of silicon wafers calibrated by quasisteady-state photoluminescence," Solar Energy Materials and Solar Cells, vol. 95, pp. 1011-1018, 2011. [64] J. A. Giesecke, M. C. Schubert, and W. Warta, "Carrier Lifetime from dynamic electroluminescence," IEEE Journal of Photovoltaics, vol. 3, pp. 1012-1015, 2013. [65] O. Breitenstein, A. Khanna, Y. Augarten, J. Bauer, J. M. Wagner, and K. Iwig, "Quantitative evaluation of electroluminescence images of solar cells," physica status solidi (RRL) – Rapid Research Letters, vol. 4, pp. 7-9, 2010. [66] H. Kampwerth, T. Trupke, J. W. Weber, and Y. Augarten, "Advanced luminescence based effective series resistance imaging of silicon solar cells," Applied Physics Letters, vol. 93, pp. 202102-3, 2008. [67] D. Hinken, K. Ramspeck, K. Bothe, B. Fischer, and R. Brendel, "Series resistance imaging of solar cells by voltage dependent electroluminescence," Applied Physics Letters, vol. 91, p. 182104, 2007. [68] M. Glatthaar, J. Haunschild, M. Kasemann, J. Giesecke, W. Warta, and S. Rein, "Spatially resolved determination of dark saturation current and series resistance of silicon solar cells," physica status solidi (RRL)-Rapid Research Letters, vol. 4, pp. 13-15, 2010. 147 [69] M. Glatthaar, J. Giesecke, M. Kasemann, J. Haunschild, M. The, W. Warta, et al., "Spatially resolved determination of the dark saturation current of silicon solar cells from electroluminescence images," Journal of Applied Physics, vol. 105, p. 113110, 2009. [70] C. Shen, H. Kampwerth, M. Green, T. Trupke, J. Carstensen, and A. Schütt, "Spatially resolved photoluminescence imaging of essential silicon solar cell parameters and comparison with CELLO measurements," Solar Energy Materials and Solar Cells, vol. 109, pp. 77-81, 2013. [71] Z. Hameiri and P. Chaturvedi, "Spatially resolved electrical parameters of silicon wafers and solar cells by contactless photoluminescence imaging," Applied Physics Letters, vol. 102, p. 073502, 2013. [72] B. Michl, D. Impera, M. Bivour, W. Warta, and M. C. Schubert, "Suns-PLI as a powerful tool for spatially resolved fill factor analysis of solar cells," Progress in Photovoltaics: Research and Applications, vol. 22, pp. 581-586, 2014. [73] W. Schottky, "Semiconductor theory of the blocking layer (in German, original title: Halbleitertheorie der Sperrschicht)," Naturwissenschaften, vol. 26, pp. 843-843, 1938. [74] N. F. Mott, "Note on the contact between a metal and an insulator or semiconductor," Mathematical Proceedings of the Cambridge Philosophical Society, vol. 34, pp. 568-572, 1938. [75] D. K. Schroder and D. L. Meier, "Solar cell contact resistance - a review," IEEE Transactions on Electron Devices, vol. 31, pp. 637-647, 1984. [76] A. Hiraki, "A model on the mechanism of room temperature interfacial intermixing reaction in various metal‐semiconductor couples: what triggers the reaction?," Journal of The Electrochemical Society, vol. 127, pp. 26622665, 1980. [77] J. Bardeen, "Surface states and rectification at a metal semi-conductor Contact," Physical Review, vol. 71, pp. 717-727, 1947. [78] A. M. Cowley and S. M. Sze, "Surface states and barrier height of metal‐semiconductor Systems," Journal of Applied Physics, vol. 36, pp. 3212-3220, 1965. [79] E. H. Rhoderick, "Metal-semiconductor contacts," Solid-State and Electron Devices, IEE Proceedings I, vol. 129, p. 1, 1982. [80] H. A. Bethe, Theory of the boundary layer of crystal rectifiers, Radiation Laboratory, Massachusetts Institute of Technology, 1942. [81] F. Padovani and R. Stratton, "Field and thermionic-field emission in Schottky barriers," Solid-State Electronics, vol. 9, pp. 695-707, 1966. [82] K. K. Ng and L. Ruichen, "On the calculation of specific contact resistivity on Si," IEEE Transactions on Electron Devices, vol. 37, pp. 15351537, 1990. 148 [83] R. B. Campbell and A. Rohatgi, "Investigation of contact metallization systems for solar cells," Journal of The Electrochemical Society, vol. 127, pp. 2702-2704, 1980. [84] V. E. Lowe, A. C. Day, V. E. Lowe, and A. C. Day, "High-temperature-stable contact metallization for silicon solar cells," IEEE Transactions on Electron Devices, vol. 31, pp. 626-629, 1984. [85] H. von Seefeld, N. W. Cheung, M. Maenpaa, and M.-A. Nicolet, "Investigation of titanium nitride layers for solar cell contacts," IEEE Transactions on Electron Devices, vol. 27, pp. 873-876, 1980. [86] M. A. Green, K. Emery, Y. Hishikawa, and W. Warta, "Solar cell efficiency tables (version 33)," Progress in Photovoltaics: Research and Applications, vol. 17, pp. 85-94, 2009. [87] J. Zhao, A. Wang, and M. A. Green, "24.5% efficiency silicon PERT cells on MCZ substrates and 24.7% efficiency PERL cells on FZ substrates," Progress in Photovoltaics: Research and Applications, vol. 7, pp. 471-474, 1999. [88] O. Schultz, S. W. Glunz, and G. P. Willeke, "Multicrystalline silicon solar cells exceeding 20% efficiency," Progress in Photovoltaics: Research and Applications, vol. 12, pp. 553-558, 2004. [89] C. Mader, J. Muller, S. Gatz, T. Dullweber, and R. Brendel, "Rear-side pointcontacts by inline thermal evaporation of aluminum," in Proc. 35th IEEE Photovoltaic Specialists Conference, 2010, pp. 1446-1449. [90] M. Kessler, D. Munster, T. Neubert, C. P. Mader, J. Schmidt, and R. Brendel, "High-efficiency back-junction silicon solar cell with an in-line evaporated aluminum front grid," in Proc. 37th IEEE Photovoltaic Specialists Conference, 2011, pp. 1085-1090. [91] M. Hörteis, T. Gutberlet, A. Reller, and S. W. Glunz, "High-temperature contact formation on n-type silicon: basic reactions and contact model for seed-layer contacts," Advanced Functional Materials, vol. 20, pp. 476-484, 2010. [92] S. De Wolf and M. Kondo, "Nature of doped a-Si: H/c-Si interface recombination," Journal of Applied Physics, vol. 105, p. 103707, 2009. [93] H. Tokuhisa, M. Yoshida, U. Itoh, I. Sumita, S. Sekine, and T. Kamata, "Glass-fritless Cu alloy pastes for silicon solar cells requiring low temperature sintering," in Proc. 37th IEEE Photovoltaic Specialists Conference, Seattle, 2011, pp. 1140-1143. [94] H. Hannebauer, T. Dullweber, U. Baumann, T. Falcon, and R. Brendel, "21.2%-efficient fineline-printed PERC solar cell with busbar front grid," physica status solidi (RRL) – Rapid Research Letters, vol. 8, pp. 675-679, 2014. [95] A. Ebong, I. B. Cooper, B. Rounsaville, A. Rohatgi, M. Dovrat, E. Kritchman, et al., "On the ink jetting of full front Ag gridlines for cost- 149 effective metallization of Si solar cells," IEEE Electron Device Letters, vol. 33, pp. 637-639, 2012. [96] A. Ebong, D. Gililov, L. Lavid, S. Krispil, S. Thygelbaum, M. Dovrat, et al., "Capitalising on the precisions of ion implantation and ink jetted fine gridline to create low-cost high efficiency silicon solar cells," Energy Procedia, vol. 33, pp. 24-32, 2013. [97] A. Mette, P. L. Richter, M. Hörteis, and S. W. Glunz, "Metal aerosol jet printing for solar cell metallization," Progress in Photovoltaics: Research and Applications, vol. 15, pp. 621-627, 2007. [98] S. Binder, J. Bartsch, M. Glatthaar, and S. Glunz, "Printed contact on emitter with low dopant surface concentration," Energy Procedia, vol. 21, pp. 32-38, 2012. [99] M. Frey, F. Clement, S. Dilfer, D. Erath, and D. Biro, "Front-side metalization by means of flexographic printing," Energy Procedia, vol. 8, pp. 581-586, 2011. [100] A. Lennon, Y. Yao, and S. Wenham, "Evolution of metal plating for silicon solar cell metallisation.," Prog. Photovolt: Res. Appl., p. doi: 10.1002/pip.2221, 2012. [101] W. Shockley and W. T. Read, "Statistics of the recombinations of holes and electrons," Physical Review, vol. 87, pp. 835-842, 1952. [102] R. N. Hall, "Electron-hole recombination in germanium," Physical Review, vol. 87, pp. 387-387, 1952. [103] R. N. Hall, "Recombination processes in semiconductors," Proceedings of the IEE - Part B: Electronic and Communication Engineering, vol. 106, pp. 923931, 1959. [104] C. T. Sah, R. N. Noyce, and W. Shockley, "Carrier generation and recombination in p-n junctions and p-n junction characteristics," Proceedings of the Institute of Radio Engineers, vol. 45, pp. 1228-1243, 1957. [105] K. R. McIntosh, "Lumps, humps and bumps: three detrimental effects in the current-voltage curve of silicon solar cells," PhD thesis, University of New South Wales, Sydney, Australia, 2001. [106] O. Breitenstein, J. P. Rakotoniaina, M. H. Al Rifai, and M. Werner, "Shunt types in crystalline silicon solar cells," Progress in Photovoltaics, vol. 12, pp. 529-538, 2004. [107] S. Steingrube, O. Breitenstein, K. Ramspeck, S. Glunz, A. Schenk, and P. P. Altermatt, "Explanation of commonly observed shunt currents in c-Si solar cells by means of recombination statistics beyond the Shockley-Read-Hall approximation," Journal of Applied Physics, vol. 110, p. 014515, 2011. [108] J. Greulich, M. Glatthaar, and S. Rein, "Fill factor analysis of solar cells' current-voltage curves," Progress in Photovoltaics, vol. 18, pp. 511-515, 2010. 150 [109] R. Hoenig, M. Glatthaar, F. Clement, J. Greulich, J. Wilde, and D. Biro, "New measurement method for the investigation of space charge region recombination losses induced by the metallization of silicon solar cells," Energy Procedia, vol. 8, pp. 694-699, 2011. [110] E. Sánchez and G. L. Araújo, "On the analytical determination of solar cell fill factor and efficiency," Solar cells, vol. 20, pp. 1-11, 1987. [111] M. A. Green, "Accuracy of analytical expressions for solar cell fill factors," Solar Cells, vol. 7, pp. 337-340, 1982. [112] O. Breitenstein, A. Khanna, and W. Warta, "Quantitative description of dark current-voltage characteristics of multicrystalline silicon solar cells based on lock-in thermography measurements," physica status solidi (a), vol. 207, pp. 2159-2163, 2010. [113] W. Shockley, "The theory of p-n junctions in semiconductors and p-n junction transistors," Bell System Technical Journal, vol. 28, pp. 435-489, 1949. [114] E. W. Weisstein, "Lambert W-function from MathWorld (a Wolfram Web resource)," http://mathworld.wolfram.com/LambertW-Function.html. Accessed on: 10th Jan 2013 [115] P. J. Cousins, D. D. Smith, H. C. Luan, J. Manning, T. D. Dennis, A. Waldhauer, et al., "Generation 3: improved performance at lower cost," in Proc. 35th IEEE Photovoltaic Specialists Conference, 2010, pp. 275-278. [116] P. Basu, K. Shetty, S. Vinodh, D. Sarangi, N. Palina, S. Duttagupta, et al., "19% Efficient inline-diffused large-area screen-printed Al-LBSF silicon wafer solar cells," Energy Procedia, vol. 27, pp. 444-448, 2012. [117] K. C. Fong, K. R. McIntosh, and A. W. Blakers, "Accurate series resistance measurement of solar cells," Progress in Photovoltaics: Research and Applications, pp. 490-499, 2013. [118] A. Mette, "New concepts for front side metallization of industrial silicon solar cells," PhD thesis, University of Freiburg, Freiburg, Germany, 2007. [119] P. Chaturvedi, B. Hoex, and T. M. Walsh, "Broken metal fingers in silicon wafer solar cells and PV modules," Solar Energy Materials and Solar Cells, vol. 108, pp. 78-81, 2013. [120] R. Hoenig, A. Kalio, J. Sigwarth, F. Clement, M. Glatthaar, J. Wilde, et al., "Impact of screen printing silver paste components on the space charge region recombination losses of industrial silicon solar cells," Solar Energy Materials and Solar Cells, vol. 106, pp. 7-10, 2012. [121] P. J. Verlinden, M. Aleman, N. Posthuma, J. Fernandez, B. Pawlak, J. Robbelein, et al., "Simple power-loss analysis method for high-efficiency Interdigitated Back Contact (IBC) silicon solar cells," Solar Energy Materials and Solar Cells, vol. 106, pp. 37-41, 2012. 151 [122] K. Bothe and J. Schmidt, "Electronically activated boron-oxygen-related recombination centers in crystalline silicon," Journal of Applied Physics, vol. 99, p. 013701, 2006. [123] A. G. Aberle, P. P. Altermatt, G. Heiser, S. J. Robinson, A. Wang, J. Zhao, et al., "Limiting loss mechanisms in 23% efficient silicon solar cells," Journal of Applied Physics, vol. 77, p. 3491, 1995. [124] G. Schubert, F. Huster, and P. Fath, "Physical understanding of printed thickfilm front contacts of crystalline Si solar cells—Review of existing models and recent developments," Solar Energy Materials and Solar Cells, vol. 90, pp. 3399-3406, 2006. [125] C. Ballif, D. M. Huljić, G. Willeke, and A. Hessler-Wyser, "Silver thick-film contacts on highly doped n-type silicon emitters: Structural and electronic properties of the interface," Applied Physics Letters, vol. 82, pp. 1878-1880, 2003. [126] C.-H. Lin, S.-Y. Tsai, S.-P. Hsu, and M.-H. Hsieh, "Investigation of Agbulk/glassy-phase/Si heterostructures of printed Ag contacts on crystalline Si solar cells," Solar Energy Materials and Solar Cells, vol. 92, pp. 1011-1015, 2008. [127] M. Prudenziati, L. Moro, B. Morten, F. Sirotti, and L. Sardi, "Ag-based thickfilm front metallization of silicon solar cells," Active and Passive Electronic Components, vol. 13, pp. 133-150, 1989. [128] Z. G. Li, L. Liang, and L. K. Cheng, "Electron microscopy study of front-side Ag contact in crystalline Si solar cells," Journal of Applied Physics, vol. 105, p. 066102, 2009. [129] Z. G. Li, L. Liang, A. S. Ionkin, B. M. Fish, M. E. Lewittes, L. K. Cheng, et al., "Microstructural comparison of silicon solar cells’ front-side Ag contact and the evolution of current conduction mechanisms," Journal of Applied Physics, vol. 110, p. 074304, 2011. [130] R. Hoenig, M. Duerrschnabel, W. van Mierlo, Z. Aabdin, J. Bernhard, J. Biskupek, et al., "The nature of screen printed front side silver contacts results of the project MikroSol," Energy Procedia, vol. 43, pp. 27-36, 2013. [131] I. B. Cooper, K. Tate, J. S. Renshaw, A. F. Carroll, K. R. Mikeska, R. C. Reedy, et al., "Investigation of the mechanism resulting in low resistance Ag thick-film contact to Si solar cells in the context of emitter doping density and contact firing for current-generation Ag paste," IEEE Journal of Photovoltaics, vol. 4, pp. 134-141, 2014. [132] V. Shanmugam, J. Cunnusamy, A. Khanna, P. K. Basu, Y. Zhang, C. Chen, et al., "Electrical and microstructural analysis of contact formation on lightly doped phosphorus emitters using thick-film Ag screen printing pastes," IEEE Journal of Photovoltaics, vol. 4, pp. 168-174, 2014. [133] A. Kalio, A. Richter, C. Schmiga, M. Glatthaar, and J. Wilde, "Study of dielectric layers for bifacial n-type silicon solar cells with regard to optical Properties, surface passivation quality, and contact formation," IEEE Journal of Photovoltaics, vol. 4, pp. 575-580, 2014. 152 [134] M. M. Hilali, K. Nakayashiki, C. Khadilkar, R. C. Reedy, A. Rohatgi, A. Shaikh, et al., "Effect of Ag particle size in thick-film Ag paste on the electrical and physical properties of screen printed contacts and silicon solar cells," Journal of the Electrochemical Society, vol. 153, pp. A5-A11, 2006. [135] M. Hilali, S. Sridharan, C. Khadilkar, A. Shaikh, A. Rohatgi, and S. Kim, "Effect of glass frit chemistry on the physical and electrical properties of thick-film Ag contacts for silicon solar cells," Journal of Electronic Materials, vol. 35, pp. 2041-2047, 2006. [136] P. K. Basu, D. Sarangi, K. D. Shetty, and M. B. Boreland, "Liquid silicate additive for alkaline texturing of mono-Si wafers to improve process bath lifetime and reduce IPA consumption," Solar Energy Materials and Solar Cells, vol. 113, pp. 37-43, 2013. [137] E. Vazsonyi, K. De Clercq, R. Einhaus, E. Van Kerschaver, K. Said, J. Poortmans, et al., "Improved anisotropic etching process for industrial texturing of silicon solar cells," Solar Energy Materials and Solar Cells, vol. 57, pp. 179-188, 1999. [138] J. Krümberg, I. Melnyk, M. Schmidt, M. Michel, T. Fidler, M. Kagerer, et al., "New innovative alkaline texturing process for CZ silicon wafers," in Proc. 24th European Photovoltaic Solar Energy Conference, Hamburg, 2009, pp. 1748-1750. [139] K. Wijekoon, T. Weidman, S. Paak, and K. MacWilliams, "Production ready novel texture etching process for fabrication of single crystalline silicon solar cells," in Proc. 35th Photovoltaic Specialists Conference, 2010, pp. 36353641. [140] M. Moynihan, C. O'Connor, B. Barr, S. Tiffany, W. Braun, G. Allardyce, et al., "In-line and vertical texturing of mono-crystalline solar cells," in Proc. 35th IEEE Photovoltaic Specialists Conference, 2010, pp. 1028-1033. [141] K. Mayer, D. Kray, T. O. Perez, M. Schumann, and S. W. Glunz, "New surfactants for combined cleaning and texturing of mono-crystalline silicon wafers after wire-sawing," in Proc. 23rd European Photovoltaic Solar Energy Conference and Exhibition, Valencia, 2008, pp. 1109-1113. [142] E. Cabrera, S. Olibet, D. Rudolph, E. Wefringhaus, R. Kopecek, D. Reinke, et al., "Influence of surface topography on the glass coverage in the contact formation of silver screen-printed Si solar cells," IEEE Journal of Photovoltaics, vol. 3, pp. 102-107, 2013. [143] Y. Han, X. Yu, D. Wang, and D. Yang, "Formation of various pyramidal structures on monocrystalline silicon surface and their influence on the solar cells," Journal of Nanomaterials, vol. 2013, pp. 1-5, 2013. [144] E. Cabrera, S. Olibet, J. Glatz-Reichenbach, R. Kopecek, D. Reinke, and G. Schubert, "Experimental evidence of direct contact formation for the current transport in silver thick film metallized silicon emitters," Journal of Applied Physics, vol. 110, p. 114511, 2011. [145] N. Ximello, A. Dastgeheib-Shirazi, S. Scholz, and G. Hahn, "Influence of pyramid size of chemically textured silicon wafers on the characteristics of 153 industrial solar cells," in Proc. 25th European Photovoltaic Solar Energy Conference, Valencia, 2010, pp. 1332-1336. [146] P. K. Basu, A. Khanna, and Z. Hameiri, "The effect of front pyramid heights on the efficiency of homogeneously textured inline-diffused screen-printed monocrystalline silicon wafer solar cells," Submitted to Renewable Energy. [147] P. K. Basu, Z. Hameiri, D. Sarangi, J. Cunnusamy, E. Carmona, and M. B. Boreland, "18.7% Efficient inline-diffused screen-printed silicon wafer solar cells with deep homogeneous emitter etch-back," Solar Energy Materials and Solar Cells, vol. 117, pp. 412-420, 2013. [148] T. E. Everhart and P. H. Hoff, "Determination of kilovolt electron energy dissipation vs penetration distance in solid materials," Journal of Applied Physics, vol. 42, pp. 5837-5846, 1971. [149] D. Drouin, A. R. Couture, D. Joly, X. Tastet, V. Aimez, and R. Gauvin, "CASINO v2.42-a fast and easy-to-use modeling tool for scanning electron microscopy and microanalysis users," Scanning, vol. 29, pp. 92-101, 2007. [150] E. Cabrera, S. Olibet, D. Rudolph, P. E. Vullum, R. Kopecek, D. Reinke, et al., "Impact of excess phosphorus doping and Si crystalline defects on Ag crystallite nucleation and growth in silver screen-printed Si solar cells," Progress in Photovoltaics: Research and Applications, 2013. [151] M. Horteis, "Fine-line printed contacts on crystalline silicon solar cells," PhD thesis, University of Constance, Constance, Germany, 2009. [152] D. Pysch, A. Mette, A. Filipovic, and S. W. Glunz, "Comprehensive analysis of advanced solar cell contacts consisting of printed fine-line seed layers thickened by silver plating," Progress in Photovoltaics: Research and Applications, vol. 17, pp. 101-114, 2009. [153] G. Schubert, "Thick film metallisation of crystalline silicon solar cells," PhD thesis, University of Constance, Constance, Germany, 2006. [154] O. Young-Woo, A. Rohatgi, K. Yeon-Ho, P. Sung-Eun, K. Dong-Hwan, L. Joon-Sung, et al., "Abnormal dopant distribution in POCl3 diffused n+ emitter of textured silicon solar cells," IEEE Electron Device Letters, vol. 32, pp. 351-353, 2011. [155] F. Llopis and I. Tobias, "Influence of texture feature size on the optical performance of silicon solar cells," Progress in Photovoltaics: Research and Applications, vol. 13, pp. 27-36, 2005. [156] SEMI PV Group Europe, "International Technology Roadmap for Photovoltaics (ITRPV)," 2015. [157] A. Ebong, B. Rounsaville, I. B. Cooper, K. Tate, A. Rohatgi, S. Glunz, et al., "High efficiency silicon solar cells with ink jetted seed and plated grid on high sheet resistance emitter," in Proc. 35th IEEE Photovoltaic Specialists Conference, 2010, pp. 1363-1367. 154 [158] S. Duttagupta, "Advanced surface passivation of crystalline silicon for solar cell applications," PhD thesis, National University of Singapore, Singapore, 2014. [159] B. Hallam, S. Wenham, A. Sugianto, L. Mai, C. Chong, M. Edwards, et al., "Record large-area p-type Cz production cell efficiency of 19.3 based on LDSE technology," IEEE Journal of Photovoltaics, vol. 1, pp. 43-48, 2011. [160] A. Dastgheib-Shirazi, H. Haverkamp, B. Raabe, F. Book, and G. Hahn, "Selective emitter for industrial solar cell production: a wet chemical approach using a single side diffusion process," in Proc. 23rd European Photovoltaic Solar Energy Conference, Valencia, 2008, pp. 1197-1199. [161] D. L. Meier and D. K. Schroder, "Contact resistance - its measurement and relative importance to power loss in a solar cell," IEEE Transactions on Electron Devices, vol. 31, pp. 647-653, 1984. [162] V. Shanmugam, J. Cunnusamy, A. Khanna, M. B. Boreland, and T. Mueller, "Optimisation of Screen-Printed Metallisation for Industrial High-Efficiency Silicon Wafer Solar Cells," Energy Procedia, vol. 33, pp. 64-69, 2013. [163] J. Bartsch, "Advanced front side metallization for crystalline silicon solar cells with electrochemical techniques," PhD thesis, University of Freiburg, Freiburg, Germany, 2011. [164] T. Fellmeth, J. Greulich, F. Clement, and D. Biro, "Modelling of silicon solar cells by using an extended two-diode model approach," in Proc. 27th European Photovoltaic Solar energy Conference, Frankfurt, 2012, pp. 13941397. [165] A. Rohatgi, D. L. Meier, B. McPherson, Y.-W. Ok, A. D. Upadhyaya, J.-H. Lai, et al., "High-throughput ion-implantation for low-cost high-efficiency silicon solar cells," Energy Procedia, vol. 15, pp. 10-19, 2012. [166] D. Chen, L. Zhao, H. Diao, W. Zhang, G. Wang, and W. Wang, "Choice of the low-temperature sintering Ag paste for a-Si:H/c-Si heterojunction solar cell based on characterizing the electrical performance," Journal of Alloys and Compounds, vol. 618, pp. 357-365, 2015. [167] F. Zicarelli, A. Descoeudres, G. Choong, P. Bole, L. Barraud, S. De Wolf, et al., "Metallisation for silicon heterojunction solar cells," in Proc. 25th European Photovoltaic Solar Energy Conference, Valencia, 2010. [168] C. Clement, H. Bell, F. Vogg, L. Rebenklau, P. Gierth, and U. Partsch, "Inert drying system for copper paste application in PV," Energy Procedia, vol. 38, pp. 423-429, 2013. [169] P. Papet, R. Efinger, B. Bram Sadlik, Y. Andrault, D. Bätzner, D. Lachenal, et al., "19% efficiency module based on Roth&Rau heterojunction solar cells and Day4™ Energy module concept," in Proc. 26th European Photovoltaic Solar Energy Conference, Hamburg, 2011, pp. 3336-3339. [170] T. Falcon and S. Clasper, "Ultra fine line print process development for silicon solar cell metalisation," in Proc. 18th European Microelectronics and Packaging Conference, 2011, pp. 1-5. 155 [171] Z. Ling, J. Ge, R. Stangl, A. Aberle, and T. Mueller, "Detailed micro Raman spectroscopy analysis of doped silicon thin film layers and its feasibility for heterojunction silicon wafer solar cells," Journal of Materials Science and Chemical Engineering, vol. 2013, pp. 1-14, 2013. [172] J. Hernandez, D. Adachi, D. Schroos, N. Valckx1, N. Menou1, T. Uto, et al., "High efficiency copper electroplated heterojunction solar cells and modulesthe path towards 25% cell efficiency," in Proc. 28th European Photovoltaic Solar Energy Conference, Paris, 2013, pp. 741-743. [173] C. M. Liu, W. L. Liu, W. J. Chen, S. H. Hsieh, T. K. Tsai, and L. C. Yang, "ITO as a diffusion barrier between Si and Cu," Journal of The Electrochemical Society, vol. 152, pp. G234-G239, 2005. [174] J. Geissbuhler, S. D. Wolf, A. Faes, N. Badel, Q. Jeangros, A. Tomasi, et al., "Silicon Heterojunction Solar Cells With Copper-Plated Grid Electrodes: Status and Comparison With Silver Thick-Film Techniques," IEEE Journal of Photovoltaics, vol. 4, pp. 1055-1062, 2014. [175] P. Papet, J. Hermans, T. Söderström, M. Cucinelli, L. Andreetta, D. Bätzner, et al., "Heterojunction solar cells with electroplated Ni/Cu front electrode," in Proc. 28th European Photovoltaic Solar Energy Conference, Paris, 2013, pp. 1976 - 1979. [176] Z. Li, P. Hsiao, W. Zhang, R. Chen, Y. Yao, P. Papet, et al., "Patterning for plated heterojunction cells," Energy Procedia, vol. 67, pp. 76-83, 2015. [177] S. De Wolf, A. Descoeudres, Z. C. Holman, and C. Ballif, "High-efficiency silicon heterojunction solar cells: a review," Green, vol. 2, pp. 7-24, 2012. [178] T. Behrendt, "Characterization and manufacturing of transparent conductive oxides for silicon heterojunction solar cells," Master thesis, ChristianAlbrechts University, Kiel, Germany, 2013. [179] M. A. Green and M. J. Keevers, "Optical properties of intrinsic silicon at 300 K," Progress in Photovoltaics: Research and Applications, vol. 3, pp. 189192, 1995. [180] K. Fukutani, M. Kanbe, W. Futako, B. Kaplan, T. Kamiya, C. M. Fortmann, et al., "Band gap tuning of a-Si:H from 1.55 eV to 2.10 eV by intentionally promoting structural relaxation," Journal of Non-Crystalline Solids, vol. 227– 230, Part 1, pp. 63-67, 1998. [181] J. Wong, "Griddler: intelligent computer aided design of complex solar cell metallization patterns," in Proc. 39th IEEE Photovoltaic Specialists Conference, Florida, 2013, pp. 933-938. [182] R. A. Sinton, A. Cuevas, and M. Stuckings, "Quasi-steady-state photoconductance, a new method for solar cell material and device characterization," in Proc. 25th IEEE Photovoltaic Specialists Conference, 1996, pp. 457-460. [183] T. Fellmeth, A. Born, A. Kimmerle, F. Clement, D. Biro, and R. Preu, "Recombination at metal-emitter interfaces of front contact technologies for 156 highly efficient silicon solar cells," Energy Procedia, vol. 8, pp. 115-121, 2011. [184] T. Trupke, R. Bardos, M. Abbott, and J. Cotter, "Suns-photoluminescence: contactless determination of current-voltage characteristics of silicon wafers," Applied Physics Letters, vol. 87, p. 093503, 2005. [185] T. Trupke, R. Bardos, and M. Abbott, "Self-consistent calibration of photoluminescence and photoconductance lifetime measurements," Applied Physics Letters, vol. 87, p. 184102, 2005. [186] J. Ge, "Surface passivation for heterojunction silicon wafer solar cells," PhD thesis, National University of Singapore, Singapore, 2014. [187] M. Huang, Z. Hameiri, H. Gong, W.-C. Wong, A. G. Aberle, and T. Mueller, "Hybrid silver nanoparticle and transparent conductive oxide structure for silicon solar cell applications," physica status solidi (RRL) – Rapid Research Letters, vol. 8, pp. 399-403, 2014. [188] S. H. Hsieh, C. M. Chien, W. L. Liu, and W. J. Chen, "Failure behavior of ITO diffusion barrier between electroplating Cu and Si substrate annealed in a low vacuum," Applied Surface Science, vol. 255, pp. 7357-7360, 2009. [189] J. Bartsch, A. Mondon, K. Bayer, C. Schetter, M. Hörteis, and S. Glunz, "Quick determination of copper-metallization long-term impact on silicon solar cells," Journal of the Electrochemical Society, vol. 157, pp. H942-946, 2010. [190] A. Jain, "Exact analytical solutions of the parameters of real solar cells using Lambert W-function," Solar Energy Materials and Solar Cells, vol. 81, pp. 269-277, 2004. [191] A. Jain and A. Kapoor, "A new method to determine the diode ideality factor of real solar cell using Lambert W-function," Solar Energy Materials and Solar Cells, vol. 85, pp. 391-396, 2005. 157 List of publications This section lists the author’s publications during this PhD research. Journal papers 1. A. Khanna, T. Mueller, R. A. Stangl, B. Hoex, P. K. Basu, and A. G. Aberle, "A fill factor loss analysis method for silicon wafer solar cells," IEEE Journal of Photovoltaics, vol. 3, pp. 1170-1177, 2013. 2. V. Shanmugam, J. Cunnusamy, A. Khanna, P. K. Basu, Y. Zhang, C. Chen, A. F. Stassen, M. B. Boreland, T. Mueller, B. Hoex, and A. G. Aberle, "Electrical and microstructural analysis of contact formation on lightly doped phosphorus emitters using thick-film Ag screen printing pastes," IEEE Journal of Photovoltaics, vol. 4, pp. 168-174, 2014. 3. A. Khanna, P. K. Basu, A. Filipovic, V. Shanmugam, C. Schmiga, A. G. Aberle, and T. Mueller, "Influence of random pyramid surface texture on silver screen-printed contact formation for monocrystalline silicon wafer solar cells," Solar Energy Materials and Solar Cells, vol. 132, pp. 589-596, 2015. 4. P. K. Basu, A. Khanna, and Z. Hameiri, "The effect of front pyramid heights on the efficiency of homogeneously textured inline-diffused screen-printed monocrystalline silicon wafer solar cells," Renewable Energy, vol. 78, pp. 590598, 2015. 5. A. Khanna, K. U. Ritzau, M. Kamp, A. Filipovic, C. Schmiga, M. Glatthaar, A. G. Aberle, and T. Mueller, “Screen-printed masking of transparent conductive oxide layers for copper plating of silicon heterojunction cell plating applications,” Applied Surface Science, vol. 349, pp. 880-886, 2015. 6. A. Khanna, R. A. Stangl, J. Wong, S. Duttagupta, A. G. Aberle, T. Mueller, “An extended fill factor loss analysis method for silicon wafer solar cells considering injection-dependent recombination,” in preparation, 2015. International conference papers 1. A. Khanna, J. Cunnusamy, F. Lin, A. G. Aberle, and T. Mueller, "Substantial improvement in the front contact resistance of screen-printed silicon wafer solar cells after a brief light-induced silver plating step," in Proc. 27th European Photovoltaic Solar Energy Conference, Frankfurt, 2012, pp. 1696-1699. 2. Z. P. Ling, F. Ma, S. Duttagupta, M. Tang, J. Ge, A. Khanna, T. Mueller, A. G. Aberle, R. A. Stangl, “Three-dimensional numerical analysis of hybrid heterojunction silicon wafer solar cells with front-side locally diffused emitter and 158 rear-side heterojunction BSF point contacts,” in Proc. 28th European Photovoltaic Solar Energy Conference, Paris, 2013, pp. 800-805. 3. A. Khanna, Z. P. Ling, V. Shanmugam, M. B. Boreland, I. Hayashi, D. Kirk, H. Akimoto, A. G. Aberle, and T. Mueller, "Screen printed metallisation for silicon heterojunction cells," in Proc. 28th European Photovoltaic Solar Energy Conference, Paris, 2013, pp. 1336-1339. 4. V. Shanmugam, J. Cunnusamy, A. Khanna, M. B. Boreland, and T. Mueller, "Optimisation of screen-printed metallisation for industrial high-efficiency silicon wafer solar cells," Energy Procedia, vol. 33, pp. 64-69, 2013. 5. R. A, Stangl, A. Khanna, J. Wong, S. Duttagupta, F. Ma, Z. Qiu, B. Hoex, A. G. Aberle, “Accurate performance prediction and loss analysis of silicon solar cells considering nonlinear recombination,” in Proc. 29th European Photovoltaic Solar Energy Conference, Amsterdam, 2014, pp. 446-450. Patent application 1. T. Mueller, A. Khanna, J. Wong, A. Karpour, F. Zheng, A. G. Aberle. Method of fabricating a solar cell. Patent Cooperation Treaty (PCT) application PCT/ SG2013/000088, 2013. 159 [...]... metals like silver (Ag)] Therefore, the focus of this PhD research is on the application and characterisation of advanced metallisation methods which are potentially suitable for cost-effective highefficiency mono-Si solar cells 3 1.2 Scientific and technical issues addressed in this thesis This thesis investigates advanced metallisation methods for mono-Si solar cells Two metallisation technologies are... annealing is evaluated for silicon heterojunction cell metallisation Screen-printed large-area silicon heterojunction cell results are presented and the loss mechanisms of these cells are discussed Substituting silver screen printing by copper plating for Si wafer solar cell metallisation can lead to significant cost savings Copper plating is especially applicable to silicon heterojunction cells because the... on a solar cell’s fill factor It is therefore necessary to identify various fill factor loss mechanisms to evaluate solar cell metallisation processes A new fill factor loss analysis method is developed in this thesis for Si wafer solar cells 2 Industrial mono-Si solar cells are random-pyramid textured on the illuminated surface and the resultant surface texture influences screen-printed contact formation... ion-implanted n+ Si regions is studied Screen printing for homojunction Si wafer solar cells typically includes a hightemperature (~800 °C) firing step for contact formation to heavily doped Si regions However, HET solar cells have two unique metallisation requirements: (1) the metal needs to contact a TCO layer and (2) the annealing step for contact formation/metal sintering needs to be restricted to... to such requirements and applied to HET cells 5 In order to metallise HET cells using metal plating, the transparent conductive oxide layer (TCO) for such cells needs to be masked before the plating step Therefore, TCO masking methods for HET cell plating using standard PV processing tools are examined 6 Copper (Cu) electroplating is investigated for HET cell metallisation with a view to reduce material... silicon (c-Si) The bandgap of c-Si is well suited for terrestrial PV applications (see section 2.1 for more details) Furthermore, Si is a cheap, abundant, environmentally benign material, and an excellent knowledge bank for Si devices has been built up by the microelectronics industry As a result Si is also the dominant material for industrial PV technologies, with Si wafer solar cells accounting for. .. reduction with regards to Si wafer solar cells requires either (1) advanced and cost-effective manufacturing technologies which improve the solar cell’s energy conversion efficiency or (2) the reduction of material costs associated with cell fabrication (example: reduction in the usage of expensive materials for solar cell processing or through the use of thinner Si wafers) Metallisation technologies... ion-implanted silicon regions A substantial reduction in the contact resistance of screen-printed silver contacts to both phosphorus-diffused and phosphorus ion-implanted silicon regions is observed after a brief silver light-induced plating step Screen printing for homojunction silicon wafer solar cells typically includes a hightemperature (800-900°C peak temperature) firing step for contact formation... Chapter 6 6 Substituting Ag screen printing by Cu plating for Si wafer solar cell metallisation can lead to significant cost savings Cu plating is especially applicable to HET cells because TCO layers in HET cells prevent cell degrading Cu diffusion into the Si wafer However, TCO layers need to be masked during plating TCO masking and Cu plating for HET cells is investigated in Chapter 7 Chapter 8 concludes... sides 𝑉𝑜𝑐 and 𝐼 𝑠𝑐 Substituting for 𝐹𝐹 in Eq (2.1), 𝜂 can be written in terms of 𝑉𝑜𝑐 , 𝐼 𝑠𝑐 and 𝐹𝐹: 𝜂= 𝑉𝑜𝑐 𝐼 𝑠𝑐 𝐹𝐹 1000 𝑊𝑚−2 × 𝐴 (2.3) 2.3 Fabrication The scope of this thesis covers metallisation methods applicable to homojunction Si solar cells and amorphous Si (a-Si:H)/c-Si heterojunction Si solar cells, both fabricated on mono-Si wafers The fabrication of both of these solar cell types is briefly . principles of silicon wafer solar cells 8 2.2 Current-voltage characteristics 11 2.3 Fabrication 12 2.3.1 Homojunction silicon wafer solar cells 12 2.3.2 Heterojunction silicon wafer solar cells. technologies for silicon wafer solar cell metallisation. The metallisation technologies are applied to silicon homojunction and amorphous silicon/ crystalline silicon heterojunction solar cells fabricated. ADVANCED METALLISATION METHODS FOR MONOCRYSTALLINE SILICON WAFER SOLAR CELLS ANKIT KHANNA (M.Tech., Indian Institute of Technology, Varanasi) A THESIS SUBMITTED FOR THE

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