Hanbook of thin film deposition processes and techiques principles methods equipment and applicaiton

HANDBOOK OF THIN-FILM DEPOSITION PROCESSES ANDTECHNIQUES Principles, Methods, Equipment and Applications Second Edition Edited by Krishna Seshan Intel CorporationSanta Clara, California

HANDBOOK OF THIN-FILM DEPOSITION PROCESSES AND

TECHNIQUES Principles, Methods, Equipment and

Applications Second Edition

Edited by

Krishna Seshan

Intel CorporationSanta Clara, California

NOYES PUBLICATIONS WILLIAM ANDREW PUBLISHING Norwich, New York, U.S.A.

tronic or mechanical, including photocopying,

recording or by any information storage and

retrieval system, without permission in writing

from the Publisher.

Library of Congress Catalog Card Number: 2001135178

ISBN: 0-8155-1442-5

Printed in the United States

Published in the United States of America by

Noyes Publications / William Andrew Publishing

Library of Congress Cataloging-in-Publication Data

Handbook of Thin-Film Deposition Processes and Techniques / [edited]

by Krishna Seshan 2nd edition

p c m

Includes bibliographical references and index.

ISBN 0-8155-1442-5

1 Thin film devices Design and construction Handbooks,

manuals, etc I Seshan, Krishna II Title.

to rely on any recommendation of materials or procedures mentioned

in this publication should satisfy himself as to such suitability, and that he can meet all applicable safety and health standards.

MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES

Series Editors

Gary E McGuire, Microelectronics Center of North Carolina

Stephen M Rossnagel, IBM Thomas J Watson Research Center

Rointan F Bunshah, University of California, Los Angeles (1927–1999), founding editor

Electronic Materials and Process Technology

CHARACTERIZATION OF SEMICONDUCTOR MATERIALS, Volume 1: edited by Gary E McGuire

CHEMICAL VAPOR DEPOSITION FOR MICROELECTRONICS: by Arthur Sherman CHEMICAL VAPOR DEPOSITION OF TUNGSTEN AND TUNGSTEN SILICIDES: by John E.

ELECTRODEPOSITION: by Jack W Dini

HANDBOOK OF CARBON, GRAPHITE, DIAMONDS AND FULLERENES: by Hugh O Pierson

HANDBOOK OF CHEMICAL VAPOR DEPOSITION, Second Edition: by Hugh O Pierson HANDBOOK OF COMPOUND SEMICONDUCTORS: edited by Paul H Holloway and Gary

HANDBOOK OF HARD COATINGS: edited by Rointan F Bunshah

HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY: edited by Jerome J Cuomo, Stephen M Rossnagel, and Harold R Kaufman

HANDBOOK OF MAGNETO-OPTICAL DATA RECORDING: edited by Terry McDaniel and Randall H Victora

HANDBOOK OF MULTILEVEL METALLIZATION FOR INTEGRATED CIRCUITS: edited by Syd R Wilson, Clarence J Tracy, and John L Freeman, Jr.

HANDBOOK OF PLASMA PROCESSING TECHNOLOGY: edited by Stephen M Rossnagel, Jerome J Cuomo, and William D Westwood

HANDBOOK OF POLYMER COATINGS FOR ELECTRONICS, Second Edition: by James

Licari and Laura A Hughes

HANDBOOK OF REFRACTORY CARBIDES AND NITRIDES: by Hugh O Pierson HANDBOOK OF SEMICONDUCTOR SILICON TECHNOLOGY: edited by William C O’Mara, Robert B Herring, and Lee P Hunt

HANDBOOK OF SEMICONDUCTOR WAFER CLEANING TECHNOLOGY: edited by Werner Kern

HANDBOOK OF SPUTTER DEPOSITION TECHNOLOGY: by Kiyotaka Wasa and Shigeru Hayakawa

HANDBOOK OF THIN FILM DEPOSITION PROCESSES AND TECHNIQUES, Second Edition:

edited by Krishna Seshan

HANDBOOK OF VACUUM ARC SCIENCE AND TECHNOLOGY: edited by Raymond L Boxman, Philip J Martin, and David M Sanders

HANDBOOK OF VLSI MICROLITHOGRAPHY, Second Edition: edited by John N Helbert

HIGH DENSITY PLASMA SOURCES: edited by Oleg A Popov

HYBRID MICROCIRCUIT TECHNOLOGY HANDBOOK, Second Edition: by James J Licari

and Leonard R Enlow

IONIZED-CLUSTER BEAM DEPOSITION AND EPITAXY: by Toshinori Takagi

MOLECULAR BEAM EPITAXY: edited by Robin F C Farrow

NANOSTRUCTURED MATERIALS: edited by Carl C Koch

SEMICONDUCTOR MATERIALS AND PROCESS TECHNOLOGY HANDBOOK: edited by Gary E McGuire

ULTRA-FINE PARTICLES: edited by Chikara Hayashi, R Ueda and A Tasaki

WIDE BANDGAP SEMICONDUCTORS: edited by Stephen J Pearton

Related Titles

ADVANCED CERAMIC PROCESSING AND TECHNOLOGY, Volume 1: edited by Jon G P Binner

CEMENTED TUNGSTEN CARBIDES: by Gopal S Upadhyaya

CERAMIC CUTTING TOOLS: edited by E Dow Whitney

CERAMIC FILMS AND COATINGS: edited by John B Wachtman and Richard A Haber CORROSION OF GLASS, CERAMICS AND CERAMIC SUPERCONDUCTORS: edited by David E Clark and Bruce K Zoitos

FIBER REINFORCED CERAMIC COMPOSITES: edited by K S Mazdiyasni

FRICTION AND WEAR TRANSITIONS OF MATERIALS: by Peter J Blau

HANDBOOK OF CERAMIC GRINDING AND POLISHING: edited by Ioan D Marinescu, Hans

K Tonshoff, and Ichiro Inasaki

HANDBOOK OF HYDROTHERMAL TECHNOLOGY: edited by K Byrappa and Masahiro Yoshimura

HANDBOOK OF INDUSTRIAL REFRACTORIES TECHNOLOGY: by Stephen C Carniglia and Gordon L Barna

MECHANICAL ALLOYING FOR FABRICATION OF ADVANCED ENGINEERING MATERIALS:

by M Sherif El-Eskandarany

SHOCK WAVES FOR INDUSTRIAL APPLICATIONS: edited by Lawrence E Murr SOL-GEL TECHNOLOGY FOR THIN FILMS, FIBERS, PREFORMS, ELECTRONICS AND SPECIALTY SHAPES: edited by Lisa C Klein

SOL-GEL SILICA: by Larry L Hench

SPECIAL MELTING AND PROCESSING TECHNOLOGIES: edited by G K Bhat

SUPERCRITICAL FLUID CLEANING: edited by John McHardy and Samuel P Sawan

To the memory of George Narita (1928–2001): kind, patient, wise, nurturing editor, and good friend.

To the memory of my beloved parents,

Kalpakam and P K Seshan.

Department of Electrical Engineering

Colorado State University

Mark Keefer

KLA-Tencor CorporationMilpitas, CA

xvi Contributors

Cameron A Moore

Department of Electrical Engineering

Colorado State University

Vivek Singh

Intel CorporationHillsboro, OR

Gordon E Moore

Increasingly any references to the current technology for the facture of integrated circuits as “semiconductor technology” is a misno-mer By now the processing relating to the silicon itself contributesrelatively few steps to the total while the various processes associated withthe deposition and patterning of the increasing number of metal andinsulating films have grown in importance Where the first metal-oxide-transistor circuits of the 1960’s took five masking steps to complete, andeven early silicon-gate circuits with single metal layer interconnectionstook only seven, modern circuits with as many as six layers of metal takewell in excess of twenty Not only are there more layers, but the composi-tion of those layers is often complex Metal conduction layers might requirebarrier films to prevent inter-diffusion or to enhance adhesion Insulatorsnot only isolate circuit elements electrically, but are used to prevent ionsfrom harming the electrical properties of the transistors In fact, if thetechnology for integrated circuit manufacture as practiced today werenamed for the majority of the processing steps, the technology could

manu-probably be more accurately described as thin-film technology.

Consistent with this change, the processing for the deposition andpatterning of films has received major research and engineering emphasisand has evolved rapidly over the last few decades Where in the ’60’s,thermal oxidation or vapor deposition was sufficient for the insulators andevaporation or sputtering of aluminum took care of the needs for conduc-tors, a large variety of sophisticated deposition techniques have grown withthe industry Today one can control both the electrical and mechanical

x Foreword

properties while achieving uniform and reproducible films from a fewatomic layers thick to several micrometers The chemistry and physics ofthe films are becoming increasingly better understood, but as they are, thedemands of the device designer become more stringent For example,where the dielectric constant of silicon oxide-based insulators was ac-cepted as a design parameter to live with for thirty years or so, capacitanceassociated with interconnections now can be a real limitation on circuitperformance Designers want an insulator with all the good properties theyhave come to love with SiO2, but with a dielectric constant as close to that

of a vacuum as possible Similarly, with conductors no one will be happyuntil we have room temperature super-conducting films in multi-layeredstructures

The simple furnaces and evaporators of yesteryear have becomemulti-chamber creations of stainless steel that allow a series of processes

to be done without exposing the work to air The lithography machines forcreating the desired precise and fine-scaled patterns now cost severalmillion dollars each as the industry pushes the limits of optical systems inthe continuing pursuit of performance and small size The cumulativeinvestment in developing and improving processes must exceed a hundredbillion dollars by now Such a huge investment of money and technicaltalent has created a vast amount of knowledge, much of which is summa-rized in this volume

The film technology developed primarily for the silicon integratedcircuit industry is finding its way into several other areas of application Ithas become a general technology for designing and constructing complexstructures, layer-by-layer Micro-electromechanical devices (MEMs) usethe same deposition and patterning techniques Micro-fluidic gadgets withmicro-sized pipes, valves and all the plumbing necessary to make tinychemical factories or analytical laboratories are increasingly important, andagain use the film technologies that grew up around semiconductor inte-grated circuits Even the gene chips the biotech industry uses to speed uptheir analysis come from the same bag of tricks

This book takes a snapshot of the state of the art in varioustechnologies relating to thin films It brings together in one convenientlocation a collection of the research results that have been gathered bymany groups over the last few decades It will be something that theconcerned engineer will return to time after time in the course of his or herwork This is the forefront of science and process engineering withimportant bearing on many modern industries

This book is the second edition of the popular book on thin-filmdeposition by Klaus K Schuegraf The previous edition is more thantwelve years old While the fundamentals have not changed, the industryhas grown enormously We’ve included an introductory chapter, “RecentChanges in the Semiconductor Industry,” which describes these changes

In addition, many new manufacturing processes, like chemical mechanicalpolishing (CMP), have become mature These are among the many factorsthat necessitated this new edition

After the introductory chapter, this second edition starts with the

“Introduction and Overview,” Ch 1 from the first edition written by W.Kern and K Schuegraf This chapter contains fundamentals that have notchanged

While the methods of growing epitaxial silicon have become muchmore sophisticated, the fundamentals are still the same and this is reflected

by our inclusion of the original chapter on “Silicon Epitaxy by ChemicalVapor Deposition” by M L Hammond

Chapter 3 on “Chemical Vapor Deposition of Silicon Dioxide Films”

by J Foggiato covers some new aspects of atmospheric and low pressureCVD oxide deposition methods

Chapter 4 on “Metal Organic CVD” by J L Zilko has been updatedwith new material These four chapters constitute the first part of the book

A completely new chapter on “Feature Scale Modeling” by V Singhhelps make the transition to physical deposition methods Modeling of

xii Preface to the Second Edition

deposition processes has become mature, improving our ability to definedesign rules for metal height and spacing to avoid porosity and pinholes thatlater compromise reliability

Going hand-in-hand with modeling is our ability to measure boththickness and spacing of submicron dimensions This has led to the growth

of many automatic and sophisticated metrology tools, and the fundamentalsbehind these instruments is described in the new chapter on the “Role ofMetrology and Inspection” by M Keefer, et al

New metrology methods are also the backbone of “ContaminationControl, Defect Detection and Yield Enhancement” by S Bhat and K.Seshan, Ch 7 The understanding of the connection between lithographyand contamination has become much more quantitative and this newchapter deals with this subject

A new chapter on “Sputtering and Sputter Deposition” by S Rossnageland three chapters from the first edition bring together all the PhysicalVapor Deposition methods The chapters from the first edition include Ch

9, “Laser and E-beam Assisted Processing,” by C Moore, et al., Ch 10 on

“Molecular Beam Epitaxy” by W S Knodle and R Chow, and Ch 11,

“Ion Beam Deposition,” by J R McNeil, et al These methods remaincentral to many metal interconnect technologies

Chapters 12 and 13 are devoted to two entirely new areas Chapter

12, “Chemical Mechanical Polishing” by K Cadien, deals with this method

of attaining the flatness that is required by modern lithography methods.This technique is so central that several—if not all—layers are polished.Chapter 13, written by K Seshan, et al., describes new materials that areused for interconnect dielectric materials—specifically organic polyimidematerials

Chapter 14, “Performance, Processing, and Lithography Trends” by

K Seshan, contains a summary of the book and a peek into the future.The audience for this handbook is the practicing engineer in themicroelectronics industry It will also be useful for engineers in relatedindustries like the magnetic memory, thin film displays, and optical inter-connect industries These industries use many of the same processes,equipment, and analysis techniques The book could also be used as asupplement to graduate courses in semiconductor manufacturing

August, 2001

The technology of thin film deposition has advanced dramaticallyduring the past 30 years This advancement was driven primarily by theneed for new products and devices in the electronics and optical industries.The rapid progress in solid-state electronic devices would not have beenpossible without the development of new thin film deposition processes,improved film characteristics and superior film qualities Thin film deposi-tion technology is still undergoing rapid changes which will lead to evenmore complex and advanced electronic devices in the future The eco-nomic impact of this technology can best be characterized by the world-wide sales of semiconductor devices, which exceeded $40 billion in 1987.This book is intended to serve as a handbook and guide for thepractitioner in the field, as a review and overview of this rapidly evolvingtechnology for the engineer and scientist, and as an introduction for thestudent in several branches of science and engineering

This handbook is a review of 13 different deposition technologies,each authored by experts in their particular field It gives a concisereference and description of the processes, methods, and equipment forthe deposition of technologically important materials Emphasis is placed

on recently developed film deposition processes for application in vanced microelectronic device fabrications that require the most demand-ing approaches The discussions of the principles of operation for thedeposition equipment and its suitability, performance, controls, capabilitiesand limitations for production applications are intended to provide the

ad-xiv Preface to the First Edition

reader with basic understanding and appreciation of these systems Keyproperties and areas of application of industrially important materialscreated by thin film deposition processes are described Extensive use ofreferences, reviews and bibliographies provides source material for spe-cific use and more detailed study

The topics covered in each chapter of this book have been carefullyselected to include advanced and emerging deposition technologies withpotential for manufacturing applications An attempt was made to comparecompeting technologies and to project a scenario for the most likely futuredevelopments Several other deposition technologies have been excludedsince adequate recent reviews are already available In addition, thetechnology for deposition or coating of films exceeding 10 microns inthickness was excluded, since these films have different applications andare in general based on quite different deposition techniques

Many people contributed and assisted in the preparation of thishandbook My thanks go to the individual authors and their employers, whoprovided detailed work and support I am especially indebted to WernerKern, who provided many valuable suggestions and assisted in co-authoringseveral sections of this book Last but not least, my special thanks go toGeorge Narita, Executive Editor of Noyes Publications, for providingcontinued encouragement and patience for the completion of all the tasksinvolved

July, 1988

This book is the second edition of the popular book on thin-filmdeposition by Klaus K Schuegraf The previous edition is more thantwelve years old While the fundamentals have not changed, the industryhas grown enormously We’ve included an introductory chapter, “RecentChanges in the Semiconductor Industry,” which describes these changes

In addition, many new manufacturing processes, like chemical mechanicalpolishing (CMP), have become mature These are among the many factorsthat necessitated this new edition

After the introductory chapter, this second edition starts with the

“Introduction and Overview,” Ch 1 from the first edition written by W.Kern and K Schuegraf This chapter contains fundamentals that have notchanged

While the methods of growing epitaxial silicon have become muchmore sophisticated, the fundamentals are still the same and this is reflected

by our inclusion of the original chapter on “Silicon Epitaxy by ChemicalVapor Deposition” by M L Hammond

Chapter 3 on “Chemical Vapor Deposition of Silicon Dioxide Films”

by J Foggiato covers some new aspects of atmospheric and low pressureCVD oxide deposition methods

Chapter 4 on “Metal Organic CVD” by J L Zilko has been updatedwith new material These four chapters constitute the first part of the book

A completely new chapter on “Feature Scale Modeling” by V Singhhelps make the transition to physical deposition methods Modeling of

xii Preface to the Second Edition

deposition processes has become mature, improving our ability to definedesign rules for metal height and spacing to avoid porosity and pinholes thatlater compromise reliability

Going hand-in-hand with modeling is our ability to measure boththickness and spacing of submicron dimensions This has led to the growth

of many automatic and sophisticated metrology tools, and the fundamentalsbehind these instruments is described in the new chapter on the “Role ofMetrology and Inspection” by M Keefer, et al

New metrology methods are also the backbone of “ContaminationControl, Defect Detection and Yield Enhancement” by S Bhat and K.Seshan, Ch 7 The understanding of the connection between lithographyand contamination has become much more quantitative and this newchapter deals with this subject

A new chapter on “Sputtering and Sputter Deposition” by S Rossnageland three chapters from the first edition bring together all the PhysicalVapor Deposition methods The chapters from the first edition include Ch

9, “Laser and E-beam Assisted Processing,” by C Moore, et al., Ch 10 on

“Molecular Beam Epitaxy” by W S Knodle and R Chow, and Ch 11,

“Ion Beam Deposition,” by J R McNeil, et al These methods remaincentral to many metal interconnect technologies

Chapters 12 and 13 are devoted to two entirely new areas Chapter

12, “Chemical Mechanical Polishing” by K Cadien, deals with this method

of attaining the flatness that is required by modern lithography methods.This technique is so central that several—if not all—layers are polished.Chapter 13, written by K Seshan, et al., describes new materials that areused for interconnect dielectric materials—specifically organic polyimidematerials

Chapter 14, “Performance, Processing, and Lithography Trends” by

K Seshan, contains a summary of the book and a peek into the future.The audience for this handbook is the practicing engineer in themicroelectronics industry It will also be useful for engineers in relatedindustries like the magnetic memory, thin film displays, and optical inter-connect industries These industries use many of the same processes,equipment, and analysis techniques The book could also be used as asupplement to graduate courses in semiconductor manufacturing

August, 2001

The technology of thin film deposition has advanced dramaticallyduring the past 30 years This advancement was driven primarily by theneed for new products and devices in the electronics and optical industries.The rapid progress in solid-state electronic devices would not have beenpossible without the development of new thin film deposition processes,improved film characteristics and superior film qualities Thin film deposi-tion technology is still undergoing rapid changes which will lead to evenmore complex and advanced electronic devices in the future The eco-nomic impact of this technology can best be characterized by the world-wide sales of semiconductor devices, which exceeded $40 billion in 1987.This book is intended to serve as a handbook and guide for thepractitioner in the field, as a review and overview of this rapidly evolvingtechnology for the engineer and scientist, and as an introduction for thestudent in several branches of science and engineering

This handbook is a review of 13 different deposition technologies,each authored by experts in their particular field It gives a concisereference and description of the processes, methods, and equipment forthe deposition of technologically important materials Emphasis is placed

on recently developed film deposition processes for application in vanced microelectronic device fabrications that require the most demand-ing approaches The discussions of the principles of operation for thedeposition equipment and its suitability, performance, controls, capabilitiesand limitations for production applications are intended to provide the

ad-xiv Preface to the First Edition

reader with basic understanding and appreciation of these systems Keyproperties and areas of application of industrially important materialscreated by thin film deposition processes are described Extensive use ofreferences, reviews and bibliographies provides source material for spe-cific use and more detailed study

The topics covered in each chapter of this book have been carefullyselected to include advanced and emerging deposition technologies withpotential for manufacturing applications An attempt was made to comparecompeting technologies and to project a scenario for the most likely futuredevelopments Several other deposition technologies have been excludedsince adequate recent reviews are already available In addition, thetechnology for deposition or coating of films exceeding 10 microns inthickness was excluded, since these films have different applications andare in general based on quite different deposition techniques

Many people contributed and assisted in the preparation of thishandbook My thanks go to the individual authors and their employers, whoprovided detailed work and support I am especially indebted to WernerKern, who provided many valuable suggestions and assisted in co-authoringseveral sections of this book Last but not least, my special thanks go toGeorge Narita, Executive Editor of Noyes Publications, for providingcontinued encouragement and patience for the completion of all the tasksinvolved

July, 1988

Foreword by Gordon E Moore ix

Preface to the Second Edition xi

Preface to the First Edition xiii

Contributors xv

Recent Changes in the Semiconductor Industry 1

Krishna Seshan 1.0 COST OF DEVICE FABRICATION 1

1.1 Role of Cleanliness in Cost of Equipment 3

1.2 Role of Chip Size Trends, Larger Fabricators, and 12" Wafers 4

1.3 Lithography, Feature Size, and Cleaner Fabricators and Equipment 4

1.4 Defect Density and the Need for Cleaner Fabricators 5

1.5 Conclusions 7

2.0 TECHNOLOGY TRENDS, CHIP SIZE, PERFORMANCE, AND MOORE’S LAW 7

2.1 Performance of Packaged Chips—Trends 8

REFERENCES 9

xviii Contents

and Overview 11

Werner Kern and Klaus K Schuegraf 1.0 OBJECTIVE AND SCOPE OF THIS BOOK 11

2.0 IMPORTANCE OF DEPOSITION TECHNOLOGY IN MODERN FABRICATION PROCESSES 12

3.0 CLASSIFICATION OF DEPOSITION TECHNOLOGIES 14

4.0 OVERVIEW OF VARIOUS THIN-FILM DEPOSITION TECHNOLOGIES 14

4.1 Evaporative Technologies 14

4.2 Glow-Discharge Technologies 17

4.3 Gas-Phase Chemical Processes 20

4.4 Liquid-Phase Chemical Formation 25

5.0 CRITERIA FOR THE SELECTION OF A DEPOSITION TECHNOLOGY FOR SPECIFIC APPLICATIONS 28

5.1 Thin-Film Applications 29

5.2 Material Characteristics 30

5.3 Process Technology 32

5.4 Thin-Film Manufacturing Equipment 35

6.0 SUMMARY AND PERSPECTIVE FOR THE FUTURE 36 ACKNOWLEDGMENTS 39

REFERENCES 40

2 Silicon Epitaxy by Chemical Vapor Deposition 45

Martin L Hammond 1.0 INTRODUCTION 45

1.1 Applications of Silicon Epitaxy 46

2.0 THEORY OF SILICON EPITAXY BY CVD 49

3.0 SILICON EPITAXY PROCESS CHEMISTRY 52

4.0 COMMERCIAL REACTOR GEOMETRIES 54

4.1 Horizontal Reactor 55

4.2 Cylinder Reactor 56

4.3 Vertical Reactor 56

4.4 New Reactor Geometry 56

5.0 THEORY OF CHEMICAL VAPOR DEPOSITION 57

6.0 PROCESS ADJUSTMENTS 60

6.1 Horizontal Reactor 61

6.2 Cylinder Reactor 63

6.3 Vertical Reactor 64

6.4 Control of Variables 66

7.0 EQUIPMENT CONSIDERATIONS FOR SILICON EPITAXY 67

7.1 Gas Control System 68

7.2 Leak Testing 68

7.3 Gas Flow Control 70

7.4 Dopant Flow Control 72

8.0 OTHER EQUIPMENT CONSIDERATIONS 78

8.1 Heating Power Supplies 78

8.2 Effect of Pressure 78

8.3 Temperature Measurement 79

8.4 Backside Transfer 82

8.5 Intrinsic Resistivity 83

8.6 Phantom p-Type Layer 84

9.0 DEFECTS IN EPITAXY LAYERS 84

10.0 SAFETY 87

11.0 KEY TECHNICAL ISSUES 87

11.1 Productivity/Cost 87

11.2 Uniformity/Quality 91

11.3 Buried Layer Pattern Transfer 91

11.4 Autodoping 96

12.0 NEW MATERIALS TECHNOLOGY FOR SILICON EPITAXY 104

13.0 LOW TEMPERATURE EPITAXY 105

xx Contents

CONCLUSIONS 106

REFERENCES 107

3 Chemical Vapor Deposition of Silicon Dioxide Films 111

John Foggiato 1.0 INTRODUCTION 111

2.0 OVERVIEW OF ATMOSPHERIC PRESSURE CVD 112

2.1 Basis of Atmospheric Deposition 116

2.2 Parameters Affecting Chemical Reactions 120

2.3 Reaction Chamber Designs 124

2.4 Process Exhaust and Particle Containment 125

3.0 PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 126

3.1 Deposition Rates 127

3.2 Film Characteristics for Different Chemistries 132

4.0 PROPERTIES OF DIELECTRIC FILMS 136

5.0 NEW DEPOSITION TECHNOLOGIES 137

5.1 Trends for CVD of Dielectric Films 143

6.0 FUTURE DIRECTIONS FOR CVD OF DIELECTRIC FILMS 147

7.0 SUMMARY 148

REFERENCES 149

4 Metal Organic Chemical Vapor Deposition: Technology and Equipment 151

John L Zilko 1.0 INTRODUCTION 151

2.0 APPLICATIONS OF MOCVD 156

3.0 PHYSICAL AND CHEMICAL PROPERTIES OF SOURCES USED IN MOCVD 158

3.1 Physical and Chemical Properties of Organometallic Compounds 160

3.2 Organometallic Source Packaging 168

3.3 Hydride Sources and Packaging 171

4.0 GROWTH MECHANISMS, CONDITIONS,

AND CHEMISTRY 1734.1 Growth Mechanisms 1734.2 Growth Conditions, Chemistry and

Materials Purity 1745.0 SYSTEM DESIGN AND CONSTRUCTION 1815.1 Leak Integrity and Cleanliness 1815.2 Oxygen Gettering Techniques 1825.3 Gas Manifold Design 1835.4 Reaction Chamber 1875.5 Exhaust and Low Pressure MOCVD 1936.0 FUTURE DEVELOPMENTS 1946.1 Improved Uniformity Over Larger Areas 1956.2 In-situ Diagnostics and Control 1956.3 New Materials 199ACKNOWLEDGMENTS 199REFERENCES 200

5 Feature Scale Modeling 205

Vivek Singh

1.0 INTRODUCTION 2052.0 COMPONENTS OF ETCH AND DEPOSITION

MODELING 2073.0 ETCH MODELING 2103.1 Ion Transport in Sheath 2123.2 Selection of Surface Transport Mechanism 2133.3 Surface Reaction Kinetics 2143.4 Simplifying Assumptions 2153.5 Modeling of Surface Re-emission 2163.6 Modeling of Surface Diffusion 2173.7 Numerical Methods 2194.0 ETCH EXAMPLES 2225.0 DEPOSITION MODELING 2286.0 DEPOSITION EXAMPLES 233

xxii Contents

7.0 REAL LIFE 237REFERENCES 238

Semiconductor Processing 241

Mark Keefer, Rebecca Pinto, Cheri Dennison,

and James Turlo

1.0 OVERVIEW 2412.0 INTRODUCTION TO METROLOGY AND

INSPECTION 2423.0 METROLOGY AND INSPECTION TRENDS:

PAST, PRESENT, AND FUTURE 2453.1 Trends in Metrology 2453.2 Trends in Defect Inspection 2463.3 Trends in Inspection Strategies 2504.0 THEORY OF OPERATION, EQUIPMENT DESIGNPRINCIPLES, MAIN APPLICATIONS,

AND STRENGTHS AND LIMITATIONS OF

METROLOGY AND INSPECTION SYSTEMS 2554.1 Film Thickness Measurement Systems 2564.2 Resistivity Measurement Systems 2614.3 Stress Measurement Systems 2644.4 Defect Inspection Systems 2694.5 Automatic Defect Classification 2774.6 Defect Data Analysis Systems 280GLOSSARY 281REFERENCES 285

Yield Enhancement in Gigabit Manufacturing 287

Suresh Bhat and Krishna Seshan

1.0 INTRODUCTION 2872.0 CONTAMINATION AND DEFECT GOALS

FOR ULSI DEVICES 289

3.0 SOURCES OF PARTICLES 2924.0 CONTAMINATION AND DEFECT

DETECTION: TOOLS OF THE TRADE 2934.1 Introduction 2934.2 Non-Patterned (Bare) Wafer Surface Defect

Detection 2954.3 Patterned Wafer Surface Defect Detection 2975.0 ADVANCED TECHNIQUES FOR TRACE

CONTAMINATION MONITORING 2995.1 Introduction 2995.2 Laser Light Scattering-Based In Situ Particle

Detectors 3005.3 Residual Gas Analyzers, Mass Spectrometry 3006.0 SUBSTRATE SURFACE PREPARATION

TECHNIQUES 3046.1 Introduction 3046.2 Aqueous Chemical Cleaning and Etching 3056.3 Role of Organic Contamination 3056.4 Summary 3077.0 CHALLENGES TO ULSI (GIGABIT)

CONTAMINATION CONTROL 3077.1 Effect of People on Particle Density

in Cleanrooms 3108.0 PROCESS EVOLUTION 3119.0 EVOLUTION OF CIRCUIT BASED

ELECTRICAL DEFECT DETECTION 31310.0 CONCLUSION 316ACKNOWLEDGMENT 316REFERENCES 317

8 Sputtering and Sputter Deposition 319

Stephen Rossnagel

1.0 INTRODUCTION 3192.0 PHYSICAL SPUTTERING THEORY 3202.1 Energy Dependence of Sputtering 3212.2 Energy and Direction of Sputtered Atoms 324

xxiv Contents

3.0 PLASMAS AND SPUTTERING SYSTEMS 3264.0 DEPOSITION RATES AND EFFICIENCIES 3355.0 REACTIVE SPUTTER DEPOSITION 3386.0 SPUTTERING SYSTEMS 3447.0 CONCLUSIONS AND FUTURE DIRECTIONS 347REFERENCES 348

Cameron A Moore, Zeng-qi Yu, Lance R Thompson,

and George J Collins

1.0 INTRODUCTION 3492.0 BEAM ASSISTED CVD OF THIN FILMS 3512.1 Conventional CVD Methods 3512.2 Electron Beam Assisted CVD 3512.3 Laser Assisted CVD 3522.4 Experimental Apparati of Beam

Assisted CVD 3522.5 Comparison of Beam Deposited Film

Properties 3543.0 SUBMICRON PATTERN DELINEATION WITH

LARGE AREA GLOW DISCHARGE PULSED

ELECTRON-BEAMS 3654.0 BEAM INDUCED THERMAL PROCESSES 3684.1 Overview 3684.2 Electron Beam Annealing of Ion-Implanted

Silicon 3704.3 Electron Beam Alloying of Silicides 3724.4 Laser and Electron Beam Recrystallization

of Silicon on SiO2 3745.0 SUMMARY AND CONCLUSIONS 376ACKNOWLEDGEMENTS 377REFERENCES 377

10 Molecular Beam Epitaxy:

Equipment and Practice 381

Walter S Knodle and Robert Chow

1.0 THE BASIC MBE PROCESS 3822.0 COMPETING DEPOSITION TECHNOLOGIES 3852.1 Liquid Phase Epitaxy 3862.2 Vapor Phase Epitaxy and MOCVD 3863.0 MBE-GROWN DEVICES 3903.1 Transistors 3943.2 Microwave and Millimeter Wave Devices 3963.3 Optoelectronic Devices 3963.4 Integrated Circuits 3974.0 MBE DEPOSITION EQUIPMENT 3984.1 Vacuum System Construction 3994.2 Sources 4034.3 Sample Manipulation 4114.4 System Automation 4124.5 Performance Parameters 4125.0 PRINCIPLES OF OPERATION 4155.1 Substrate Preparation 4175.2 Growth Procedure 4195.3 In Situ Analysis 4255.4 Materials Evaluation 4275.5 Safety 4316.0 RECENT ADVANCES 4316.1 RHEED Oscillation Control 4326.2 GaAs on Silicon 4326.3 Oval Defect Reduction 4346.4 Chemical Beam Epitaxy/Gas Source MBE 4346.5 Superlattice Structures 4377.0 FUTURE DEVELOPMENTS 4397.1 Production Equipment 4397.2 In Situ Processing 4417.3 Process Developments 4427.4 Toxic Gases and Environmental Concerns 444REFERENCES 444

xxvi Contents

11 Ion Beam Deposition 463

John R McNeil, James J McNally, and Paul D Reader

1.0 INTRODUCTION 4632.0 OVERVIEW OF ION BEAM APPLICATIONS 4642.1 Categories of Kaufman Ion Sources 4642.2 Operational Considerations 4673.0 ION BEAM PROBING 4684.0 SUBSTRATE CLEANING WITH ION BEAMS 4715.0 APPLICATIONS 4755.1 Ion Beam Sputtering 4755.2 Ion Assisted Deposition 4835.3 Application Summary 4966.0 CONCLUDING COMMENTS 497ACKNOWLEDGMENTS 497REFERENCES 497

12 Chemical Mechanical Polishing 501

Kenneth C Cadien

1.0 INTRODUCTION 5012.0 PROCESSING 5032.1 Oxide Polish 5042.2 STI Polish 5062.3 Tungsten Polish 5063.0 POLISH EQUIPMENT 5074.0 HISTORY 5085.0 INNOVATIONS 5096.0 AUTOMATION 5107.0 WAFER/PAD RELATIVE MOTION 5108.0 FUTURE CHALLENGES 510CONCLUSION 511REFERENCES 512

13 Organic Dielectrics in Multilevel Metallization

of Integrated Circuits 513

Krishna Seshan, Dominic J Schepis, and

Laura B Rothman

1.0 GENERAL INTRODUCTION 5132.0 HISTORICAL PERSPECTIVE 5173.0 FUNDAMENTAL CHEMISTRY OF ORGANIC

DIELECTRICS 5243.1 Materials Options 5243.2 Polyimide Structure 5273.3 Depositing Polyimides 5313.4 Moisture Absorption 5313.5 Solvent Effects 5343.6 Oxidation 5353.7 Dimensional Stability 5363.8 Metal-Polymer Interactions 5363.9 Photosensitive Organic Dielectrics 5393.10 Summary 5404.0 PROCESSING OF POLYMER FILMS 5404.1 Substrate Preparation and Polyimide Coating 5414.2 Polyimide Adhesion 5424.3 Curing of Polyimides 5444.4 Diffusion of Water 5444.5 Summary 5465.0 PROCESS INTEGRATION WITH ORGANIC

DIELECTRICS 5465.1 Processes for Forming MLM Structures 5475.2 Patterning of Organic Dielectrics 5515.3 Planarization 5535.4 Thermal Budget Considerations 5565.5 Examples or Organic Dielectrics in

Semiconductor Technologies 5585.6 Summary 560

xxviii Contents

6.0 RELIABILITY 5606.1 Adhesion and Its Connection to Diffusion

of Metal into Polyimide: The Interphase andInterface Stress 5616.2 Effect of Moisture Ingress 5686.3 Mechanical 5706.4 Electrical Properties 5716.5 Long Term Reliability 5746.6 Summary 5767.0 PERFORMANCE ADVANTAGES OF ORGANICDIELECTRICS 5767.1 Performance Comparisons 5777.2 Performance Conclusions 5847.3 Factors in the Ultimate Limits to Performance 5848.0 FUTURE TRENDS 586REFERENCES 588

Trends 595

Krishna Seshan

1.0 INTRODUCTION 5952.0 SCALING THE TRANSISTOR 5963.0 LOW RESISTANCE: CHANGE TO

COPPER-BASED METALLURGY 5994.0 TREND TO LOW K MATERIALS 6015.0 LITHOGRAPHY AND PLANARIZATION 6036.0 CHALLENGES TO CONTAMINATION/

CLEANING 6036.1 Detection/Types of Contamination 6036.2 Trends in Integrated Processing 6047.0 SUMMARY 606REFERENCES 606

Index 609

The size, importance, and the economic impact of the semiconductorindustry have undergone a sea change in recent years The role ofequipment has been the fuel for this change New processing steps havebecome necessary, old ones have become cleaner, greener and moresophisticated Everything has become much cleaner and more expensive;

it is common for pieces of equipment to cost multiple millions of dollars.The result is a new manufacturing environment for the industry

1.0 COST OF DEVICE FABRICATION

Graphs and tables in this section quantify that semiconductor cators generate large revenues, but their manufacturing costs have alsobecome very large This increase in equipment cost is driven by the needfor very clean fabricators and processing steps The connections betweenfeature size, contamination control, and cost are discussed below

fabri-Semiconductor Industry

Krishna Seshan

2 Thin-Film Deposition Processes and Technologies

The graph in Fig 1 shows a breakdown of the cost of devicefabrication into equipment and land/building costs It is clear that theequipment component of cost is now the major contributor Notice theincrease as the industry moves to 12" wafers

The growth of the semiconductor industry and the sales of ing equipment are related as shown in Fig 2

process-Figure 1 Equipment component of total fabrication costs is increasing much faster than

land and buildings (Source: Dataquest Report 2000.)

Figure 2 Electronic equipment sales, semiconductor sales value, and yearly fluctuations.

(Data adapted from “Worldwide IC Industry Economic Update and Forecast.”)

Year 1999 2001 2003 2006 2009

Allowable Defect per sq

Table 1 Projected Increase in Mask Layers and Decrease in Allowable

Defects

The graphs above make the following three points:

• Costs of device fabrication have increased The cost of a 12"fab is in the billions of dollars

• The value of the semiconductor products manufactured,memory and mircroprocessors, is measured in the billions ofdollars

• A large fraction of the fabricator’s cost is the cost ofmanufacturing equipment This book is a detailed account ofthe processes performed by the equipment

1.1 Role of Cleanliness in Cost of Equipment

By far the biggest change has been our understanding of the role ofdefects and particle sizes as the lithography moves into the nanometerregime Table 1 shows industry estimates of defect densities that can betolerated It is implied that the defects at or smaller than the litho size can

be fatal, causing yield loss

The table also shows how the mask layers increase and the number

of defects per unit area have to decrease This table emphasizes theimportance of cleanliness in semiconductor processing It is for this reasonthat a new chapter on contamination and contamination control (Ch 7) hasbeen added to this edition

4 Thin-Film Deposition Processes and Technologies

1.2 Role of Chip Size Trends, Larger Fabricators, and 12" Wafers

The importance of clean fabrication facilities and equipment becomesall the more pertinent when we consider that chip sizes with increasedfunctionality increase with time and with decreasing lithography feature

size This is shown in the graph below (Fig 3).

As chip size increases, so does the need for more wafer starts Onedirection the industry has to go is to move the fabricators to larger sizewafers

Figure 3 Plot of chip size in mm2 vs lithographic generation These are best guess estimates The point to note is that die that can be expected fill the litho field size (800 mm

1.4 Defect Density and the Need for Cleaner Fabricators

There are two complications with defect density First, the maskcount is increasing and the number of critical layers is increasing Masklayers are expected to increase from 20 mask layer levels to 30 Secondly,the line size is decreasing—so smaller defects become killer defects Thenet result is that both fabricators and equipment has to become cleaner

One way to measure this is to track what the critical defect density, D0

(defects/m2), needs to be to get 60% yield as shown in Table 2 Thesenumbers are based on predicted chip size areas and are shown here inorder to explain the trend These are not exact numbers

The need for decreased feature sizes and the increase in the number

of critical masking layers drive cleaner fabricators It is instructive toexamine the plot of cumulative yield vs the critical defect concentration asshown in Fig 5 This graph shows that a defect density of 0.5/cm2 willreduce the yield by about 1% It is evident from the graph that bothfabricators and equipment will have to meet stringent cleanliness stan-dards, at least Class 10 or better Class 10 clean rooms are expensive tobuild—with estimates of thousands of dollars per sq foot

Cleanroom Class designations generally refer to the Federallyagreed-upon standards set forth in FED STD 209B which is shown inpart in Table 3.[1]

Figure 4 This graph of printable line width estimate vs litho wavelength shows that

particles as small as 250 nm could become critical defects As line width decreases, more layers become critical, and cleaner the tool and the fabricators have to become.

6 Thin-Film Deposition Processes and Technologies

Table 2 Estimates of Do, the Critical Defect Density Required

Table 3 Specifications From FED STD 209B

Figure 5 The yield equation is plotted for a one and a five critical-layer process Notice

that to get 60% yeild, the equipment and fabricators have to be better than a defect level of 0.01–0.03 defects/cm 2

1.5 Conclusions

The preceding brief discussion and data shows the following:

• Improved lithography decreases feature size

• The number of mask layers increase because of higherintegration of chip design

• These combine to call for smaller defects and cleanerprocessing conditions

• Equipment then has to become more sophisticated, cleaner,and more expensive

2.0 TECHNOLOGY TRENDS, CHIP SIZE, PERFORMANCE, AND MOORE’S LAW

The semiconductor industry follows a predictable trend—one wherethe transistor density doubles every generation, in about 3-year cycles.This has come to be known as Moore’s Law In the section below, thesetrends are examined in detail

In order to simplify and unify the growth predictions of the industry,the SIA (Semiconductor Industry Association) publishes a roadmap, theSIA Industry Roadmap The numbers shown in Table 4 are drawn fromthat report.[1]

8 Thin-Film Deposition Processes and Technologies

DRAM devices are historically viewed as technology drivers Nowmicroprocessors have closed the technology gap DRAM focus is onminimization of area occupied by memory cells To increase cell densitythe cell size must be as small as possible In microprocessors, performance

is dominated by the length of the transistor gate and by the number ofinterconnect layers

2.1 Performance of Packaged Chips—Trends

Performance increase follows the decrease in cell size: the transistordrives increase and switching times decrease because the charge beingswitched decreases This enables larger chips to be designed and morefunctionality to be integrated These trends may be seen in the Fig 6

An empirical observation made by Gordon Moore can be seen in Fig

7 Often chip size, or the number of transistors, or the density is plotted Allthree graphs show the same trend: one that says that density doubles everygeneration or about three years

Figure 6 As cell sizes decrease, the chip frequencies increase.

1 National Technology Roadmap for Semiconductors—SIA (1997) The most

recent roadmap should be consulted for exact figures Most of the data used

in this chapters are drawn from this book only to show the trends

2 Mittal, K L (editor), Treatise on Clean Surface Technology, Vol 1, Plenum,

New York (1987)

3 IC Technology Trends, ICE Corp (2001)

4 Rubloff, G W., and Bordonaro, D T., Manufacturing Trends, IBM J Res and Dev., 36(2) (March, 1992)

Figure 7 Projected growth of DRAMs and MPUs The chip sizes are also plotted.

Microporcessor density tends to be lower than DRAM density because logic circuits cannot be drawn as tightly as memory.

1

Deposition Technologies and Applications:

Introduction and

Overview

Werner Kern and Klaus K Schuegraf

1.0 OBJECTIVE AND SCOPE OF THIS BOOK

The aim of this book is to provide a concise reference and tion of the processes, methods, and equipment for depositing technologi-cally important materials Emphasis is placed on the most recently devel-oped processes and techniques of film deposition for applications in hightechnology, in particular, advanced microelectronic device fabricationthat requires the most sophisticated and demanding approaches Thevolume is intended to serve as a handbook and guide for the practitioner inthe field, as a review and overview of this rapidly evolving technology forthe engineer and scientist, and as an introduction to the student in severalbranches of science and engineering

descrip-The discussions of the principles of operation of deposition equipmentand its suitability, performance, control, capabilities, and limitations forproduction applications are intended to provide the reader with a basicunderstanding and appreciation of these systems Key properties and areas

of application of industrially important materials created by thin-filmdeposition processes are described Extensive use of references, reviews,and bibliographies is made to provide source material for specific use andmore detailed study

The chapter topics have been carefully selected to include primarilyadvanced and emerging deposition technologies in this rapidly evolvingfield Many other important deposition technologies have not been in-cluded if adequate recent reviews are already available, or if the technolo-gies are primarily intended for forming thick films or coatings that gener-ally exceed a thickness of about ten micrometers, but the importance ofthese technologies is nevertheless recognized Finally, an attempt has beenmade to compare competing technologies and to project a scenario for themost likely developments in the future

2.0 IMPORTANCE OF DEPOSITION TECHNOLOGY IN MODERN FABRICATION PROCESSES

Deposition technology can well be regarded as the major key to thecreation of devices such as computers, since microelectronic solid-statedevices are all based on material structures created by thin-film deposi-tion Electronic engineers have continuously demanded films of improvedquality and sophistication for solid-state devices, requiring a rapid evolu-tion of deposition technology Equipment manufacturers have made suc-cessful efforts to meet the requirements for improved and more economi-cal deposition systems and for in situ process monitors and controls formeasuring film parameters Another important reason for the rapid growth

of deposition technology is the improved understanding of the physics andchemistry of films, surfaces, interfaces, and microstructures made pos-sible by the remarkable advances in analytical instrumentation during thepast twenty years A better fundamental understanding of materials leads

to expanded applications and new designs of devices that incorporatethese materials