1. Trang chủ
  2. » Thể loại khác

Springer introduction to focused ion beams instrumentation theory,techniques and practice giannuzzi 2005 springer

377 116 0

Đang tải... (xem toàn văn)

Tài liệu hạn chế xem trước, để xem đầy đủ mời bạn chọn Tải xuống

THÔNG TIN TÀI LIỆU

Thông tin cơ bản

Định dạng
Số trang 377
Dung lượng 19,45 MB

Nội dung

TeAM YYeP G Digitally signed by TeAM YYePG DN: cn=TeAM YYePG, c=US, o=TeAM YYePG, ou=TeAM YYePG, email=yyepg@msn com Reason: I attest to the accuracy and integrity of this document Date: 2005.07.01 19:20:13 +08'00' INTRODUCTION TO FOCUSED ION BEAMS Instrumentation, Theory, Techniques and Practice This page intentionally left blank INTRODUCTION TO FOCUSED ION BEAMS Instrumentation, Theory, Techniques and Practice Edited by Lucille A Giannuzzi FEI Company Fred A Stevie North Carolina State University Springer eBook ISBN: Print ISBN: 0-387-23313-X 0-387-23116-1 ©2005 Springer Science + Business Media, Inc Print ©2005 Springer Science + Business Media, Inc Boston All rights reserved No part of this eBook may be reproduced or transmitted in any form or by any means, electronic, mechanical, recording, or otherwise, without written consent from the Publisher Created in the United States of America Visit Springer's eBookstore at: and the Springer Global Website Online at: http://ebooks.kluweronline.com http://www.springeronline.com Dedication This book is dedicated to Jeff Bindell, whose insight made it possible to have leading edge instrumentation available and whose inclusiveness fostered the interactions that provided much of the material for this work This page intentionally left blank Contents Dedication Contributing Authors Preface The Editors Acknowledgments The Focused Ion Beam Instrument F A STEVIE, L A GIANNUZZI, AND B I PRENITZER v xi xiii xv xvii Ion - Solid Interactions L A GIANNUZZI, B I PRENITZER, B W KEMPSHALL 13 Focused Ion Beam Gases for Deposition and Enhanced Etch F A STEVIE, D P GRIFFIS, AND P E RUSSELL 53 Three-Dimensional Nanofabrication Using Focused Ion Beams T KAITO 73 Device Edits and Modifications K N HOOGHAN 87 viii Introduction to Focused Ion Beams The Uses of Dual Beam FIB in Microelectronic Failure Analysis B.HOLDFORD 107 High Resolution Live Imaging of FIB Milling Processes For Optimum Accuracy 133 P GNAUCK, P HOFFROGGE, M SCHUMANN FIB For Materials Science Applications - A Review M W PHANEUF 143 Practical Aspects of FIB TEM Specimen Preparation R ANDERSON AND S J KLEPEIS 173 10 FIB Lift-Out Specimen Preparation Techniques 201 L.A GIANNUZZI, B W KEMPSHALL, S.M SCHWARZ, J.K LOMNESS, B.I PRENITZER, AND F.A STEVIE 11 A FIB Micro-Sampling Technique And A Site Specific TEM Specimen 229 Preparation Method T.KAMINO, T.YAGUCHI, T.HASHIMOTO, T.O HNISHI AND K.U MEMURA 12 Dual-Beam (FIB-SEM) Systems R J YOUNG AND M V MOORE 247 13 Focused Ion Beam Secondary Ion Mass Spectrometry (FIB-SIMS) 269 F A STEVIE 14 Quantitative Three-Dimensional Analysis Using Focused Ion Beam 281 Microscopy D.N DUNN, A.J K UBIS AND R H ULL 15 Application of FIB In Combination With Auger Electron Spectroscopy E L PRINCIPE 301 Appendix A: Ga Ion Sputter Yields 329 Appendix B: Backsputtered Ga Ion Fraction 333 Appendix C: 30 keV Ga Ion Range at degrees 337 Appendix D: 30 keV Ga Ion Range at 88 degrees 341 30 ke V Ga ion range at 88 degrees 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 Ho Er Tm Yb Lu Hf Ta W Re Os Ir Pt Au Hg Tl Pb Bi Po At Rn Fr Ra Ac Th Pa U 11.3 10.9 9.9 16.1 10.0 7.9 5.5 4.7 4.5 4.7 5.3 6.6 7.0 8.8 10.3 8.6 12.2 14.7 10.5 10.4 13.3 23.0 14.9 11.8 8.0 7.9 6.9 7.6 5.9 11.5 4.5 6.1 4.1 2.6 2.7 3.7 3.2 4.3 4.7 6.1 8.1 5.4 8.0 8.3 5.3 6.7 8.8 13.1 9.4 8.0 4.3 4.8 343 19.2 15.9 15.9 21.5 17.4 10.7 9.4 8.2 8.4 6.9 8.6 8.4 8.9 11.3 16.1 12.7 14.2 21.4 13.1 16.6 18.9 27.6 16.6 14.3 11.4 10.2 24.9 21.2 20.8 29.2 20.4 14.2 11.3 10.0 10.4 8.2 10.4 9.8 11.2 16.3 19.7 17.1 17.5 26.2 16.3 20.0 25.2 31.7 21.8 18.5 13.9 12.5 22.3 18.0 19.2 26.4 19.6 13.4 11.0 9.5 10.0 8.5 10.6 11.1 10.5 15.7 19.5 15.7 18.8 24.4 17.5 22.6 22.3 32.0 21.1 17.2 13.5 12.4 14.8 13.1 12.6 18.0 10.0 9.0 6.1 5.9 6.3 4.6 6.8 6.3 7.1 12.7 10.9 11.7 10.2 14.0 10.3 10.6 16.4 15.5 13.0 11.0 7.0 7.2 This page intentionally left blank Appendix E: keV Ga Ion Range at degrees Z Element 10 11 12 13 14 15 16 17 18 19 20 21 22 23 H He Li Be B C N O F Ne Na Mg Al Si P S Cl Ar K Ca Sc Ti V Longitudinal Range 117.8 106.1 30.3 9.8 7.7 7.8 16.9 12.2 16.8 15.1 19.7 1.1 7.4 8.7 11.1 10.0 11.3 14.5 27.6 15.0 8.2 5.2 3.9 Longitudinal Straggle Lateral Projected Range Lateral Straggle 6.0 15.3 5.2 1.8 1.5 1.7 4.6 3.3 5.0 5.2 6.6 3.8 2.6 3.4 4.2 4.1 4.7 7.4 13.2 7.2 4.2 2.5 1.9 6.1 9.5 3.8 1.5 1.4 1.5 3.4 2.9 3.8 3.5 4.3 2.5 1.6 2.4 2.9 2.6 3.1 4.8 8.9 5.4 3.0 1.7 1.5 7.4 12.2 4.8 1.9 1.8 1.9 4.2 3.6 4.6 4.4 5.5 3.1 2.1 2.9 3.7 3.3 3.9 6.3 11.3 6.6 3.7 2.3 2.0 Radial Range 9.7 13.9 6.0 2.5 2.1 2.4 4.8 4.1 5.7 5.5 7.2 4.0 3.0 3.6 4.6 4.4 5.1 7.6 12.8 7.7 4.2 2.6 2.4 Radial Straggle 4.5 7.8 3.3 1.2 1.0 1.1 2.3 2.2 3.2 3.0 3.9 2.2 1.7 2.0 2.4 2.6 3.6 4.6 7.1 4.3 2.3 1.4 1.4 Appendix E 346 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 Cr Mn Fe Co Ni Cu Zn Ga Ge As Se Br Kr Ru Sr Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te I Xe Cs Ba La Ce Pr Nd Pm Sm Eu Gd Tb Dy 3.3 3.2 3.1 2.8 2.9 2.8 3.6 4.6 5.1 5.1 6.4 9.3 1.1 21.8 11.5 7.6 4.8 3.7 3.0 2.9 2.7 2.6 2.7 3.3 4.1 5.5 5.4 5.8 6.1 8.8 13.9 20.3 15.4 6.4 6.6 5.8 6.2 7.4 6.2 9.5 6.2 5.6 5.7 1.5 1.5 1.4 1.7 1.6 1.7 2.0 2.7 3.0 2.8 3.7 6.3 7.7 13.6 7.7 4.5 2.7 2.5 1.9 1.9 1.7 1.7 1.9 2.2 2.1 3.6 3.5 3.8 4.3 5.3 9.5 12.5 8.8 3.5 4.1 3.0 3.7 4.8 3.7 5.9 4.1 3.2 3.7 1.4 1.3 1.3 1.2 1.1 1.3 1.6 1.7 2.2 1.9 2.9 4.0 5.0 10.9 4.9 3.5 2.3 1.6 1.5 1.2 1.3 1.2 1.4 1.4 2.1 2.5 2.7 2.8 3.1 3.9 6.5 11.0 6.3 3.6 3.0 2.9 3.0 3.7 3.2 4.7 2.7 3.2 2.7 1.8 1.7 1.6 1.4 1.4 1.7 2.0 2.2 3.0 2.4 3.7 5.0 6.4 14.2 6.5 4.4 3.9 2.0 1.9 1.5 1.8 1.5 1.8 1.8 3.0 3.5 3.5 3.7 4.0 5.1 8.1 14.9 8.3 4.3 3.8 3.7 3.9 4.8 4.1 5.7 3.7 4.2 3.5 2.0 2.1 2.0 1.8 1.8 2.1 2.4 2.7 3.4 2.9 4.3 6.0 7.2 15.4 7.9 5.3 3.4 2.4 2.3 2.0 2.1 2.1 2.2 2.2 3.3 3.9 4.1 4.6 4.8 5.9 11.4 17.1 9.6 5.0 4.7 4.5 4.7 5.4 4.8 7.2 4.4 4.6 4.2 1.2 1.2 1.1 1.0 0.9 1.2 1.5 1.4 2.2 1.6 2.5 3.5 4.6 9.2 4.7 2.9 2.3 1.3 1.5 1.3 1.3 1.3 1.3 1.1 2.3 2.4 2.5 2.7 3.0 3.8 7.0 10.8 5.8 2.9 3.0 2.9 3.0 3.2 2.9 4.4 3.9 3.1 2.3 keV Ga ion range at degrees 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 Ho Er Tm Yb Lu Hf Ta W Re Os Ir Pt Au Hg Tl Pb Bi Po At Rn Fr Ra Ac Th Pa U 5.2 5.8 5.3 7.2 5.2 3.7 3.1 2.6 2.6 2.3 2.5 2.7 2.9 4.3 5.3 5.2 5.3 6.3 5.9 6.7 7.0 13.7 6.8 6.3 4.5 3.2 3.2 3.5 3.5 4.5 2.8 2.4 1.6 1.5 1.6 1.4 1.6 1.7 1.6 3.0 3.4 3.5 3.1 3.6 3.7 4.1 4.6 8.5 3.9 4.2 2.6 2.0 347 2.9 3.0 3.0 3.6 2.9 2.3 1.6 1.3 1.4 1.1 1.2 1.3 1.6 2.6 2.6 2.7 3.7 4.0 3.3 3.7 3.3 7.5 3.6 3.3 2.4 2.0 3.9 4.1 3.9 4.9 3.6 3.0 2.1 1.7 1.9 1.6 1.6 1.8 2.1 3.5 3.4 3.4 4.7 5.2 4.3 4.7 4.2 9.6 4.7 4.2 3.1 2.7 4.4 4.5 4.3 6.1 4.3 3.5 2.6 2.0 2.3 1.9 2.0 2.2 2.5 3.9 4.4 4.2 5.5 5.6 5.1 5.3 5.6 11.6 5.6 5.1 3.8 3.2 2.7 3.1 2.6 4.1 2.4 2.0 1.6 1.4 1.6 1.1 1.2 1.3 1.7 2.5 2.4 2.2 3.1 3.4 3.0 2.9 3.3 6.4 3.4 2.6 2.2 1.9 This page intentionally left blank Appendix F: keV Ga Ion Range at 88 degrees Z Element 10 11 12 13 14 15 16 17 18 19 20 21 22 23 H He Li Be B C N O F Ne Na Mg Al Si P S Cl Ar K Ca Sc Ti V Longitudinal Range 8.0 12.9 4.7 1.8 1.6 1.8 3.4 2.9 4.3 3.8 5.2 3.0 2.1 2.6 3.5 3.3 4.2 6.1 9.9 5.5 2.5 2.1 1.4 Longitudinal Straggle 5.3 9.0 3.4 1.0 0.9 0.9 2.4 2.2 2.6 2.3 3.2 1.6 1.5 1.4 2.3 1.8 3.0 3.3 5.5 3.2 1.6 1.2 1.0 Lateral Projected Range Lateral Straggle 119.2 104.0 31.9 9.6 7.5 7.7 17.2 13.5 16.7 15.0 19.7 10.8 8.3 8.2 10.7 10.1 11.8 15.3 23.6 14.9 8.3 4.4 3.9 119.4 105.0 32.5 9.7 7.6 7.9 18.0 14.0 17.6 15.9 20.8 11.4 8.8 8.7 11.6 10.6 12.9 16.9 25.7 16.8 9.2 5.1 4.3 Radial Range 119.4 104.6 32.4 9.7 7.6 7.0 17.6 13.9 17.1 15.4 20.3 11.3 8.7 8.7 11.2 10.8 12.4 16.2 25.3 16.2 9.1 5.2 4.4 Radial Straggle 6.5 14.7 5.9 1.4 1.3 1.6 5.1 3.3 5.6 5.2 6.7 3.4 3.1 2.9 4.4 3.3 5.4 17.0 10.0 7.4 4.0 2.4 1.8 Appendix F 350 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 Cr Mn Fe Co Ni Cu Zn Ga Ge As Se Br Kr Ru Sr Y Zr Nb Mo Tc Ru Rh Pd Ag Cd In Sn Sb Te I Xe Cs Ba La Ce Pr Nd Pm Sm Eu Gd Tb Dy 1.4 1.2 1.2 1.2 1.2 1.1 1.4 2.8 2.2 2.1 3.4 4.9 6.1 9.6 6.6 3.1 2.3 2.1 1.4 1.5 1.5 1.5 1.4 1.5 2.5 2.9 2.6 3.6 3.6 3.7 9.6 13.2 6.8 2.9 3.7 3.8 3.4 4.1 3.2 5.0 3.3 3.1 3.3 0.9 0.8 0.9 0.7 0.7 0.6 1.0 1.9 1.2 1.7 2.6 2.4 4.5 7.5 4.5 1.6 1.9 1.6 0.9 0.9 1.1 1.1 1.1 1.1 1.6 1.9 2.0 2.7 2.0 2.5 5.5 8.4 3.6 1.7 2.7 2.7 2.1 3.3 1.8 2.9 2.5 2.4 2.6 3.3 3.2 3.0 3.0 2.9 2.7 4.1 4.4 5.2 4.6 6.2 9.7 12.1 18.7 9.6 5.5 4.2 4.2 2.5 2.3 2.6 2.6 2.3 3.1 3.4 3.8 5.4 6.1 5.2 7.5 16.4 18.1 11.2 5.2 5.9 5.8 5.0 7.4 5.2 8.2 5.4 5.6 4.6 3.6 3.5 3.2 3.2 3.0 2.9 4.6 5.1 6.1 5.4 7.2 11.5 14.2 22.9 10.9 6.6 5.6 4.6 3.1 2.7 3.2 3.3 2.8 3.6 3.9 4.9 6.5 7.6 6.1 9.0 18.9 23.0 14.2 6.2 7.3 6.9 5.9 10.0 6.1 10.1 7.0 7.3 5.5 3.7 3.5 3.3 3.3 3.1 3.0 4.6 5.0 6.2 5.5 6.9 11.2 13.1 21.0 11.8 6.8 5.0 4.6 3.4 3.0 3.0 3.0 3.0 3.7 4.4 4.8 6.0 7.5 6.2 9.2 18.8 21.9 3.9 6.4 7.1 7.0 6.2 8.4 6.4 10.3 6.5 6.5 6.0 1.5 1.4 1.3 1.2 1.1 1.1 2.0 2.4 3.1 2.9 4.0 6.0 7.8 13.5 5.4 3.8 3.7 2.1 1.8 1.7 1.8 1.9 1.7 1.9 2.4 3.1 3.8 4.4 3.4 6.1 9.5 15.9 9.3 3.8 4.3 4.0 3.0 6.8 3.4 5.9 4.5 4.7 3.6 keV Ga ion range at 88 degrees 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 Ho Er Tm Yb Lu Hf Ta W Re Os Ir Pt Au Hg Tl Pb Bi Po At Rn Fr Ra Ac Th Pa U 3.0 2.7 2.4 3.8 2.3 2.5 2.3 1.9 1.3 1.6 1.6 1.4 2.1 2.5 3.1 3.2 4.4 4.0 3.4 4.7 3.5 8.5 4.0 4.1 2.4 2.9 1.8 1.5 1.5 2.5 1.4 1.4 1.4 1.1 0.8 1.0 0.9 1.0 1.1 1.5 2.0 2.0 3.3 1.7 2.4 3.7 3.1 5.4 2.9 2.9 1.6 2.0 351 4.2 4.4 3.4 5.1 3.7 3.5 3.0 3.0 1.8 2.0 1.9 1.7 2.9 3.1 3.8 3.3 5.4 4.0 5.2 6.0 4.4 8.1 6.4 5.3 2.7 3.2 4.9 5.2 4.2 6.7 4.4 4.1 3.4 3.6 2.4 2.5 2.4 2.1 3.3 3.8 5.1 4.1 6.8 5.5 6.2 7.9 5.2 12.0 8.1 7.4 3.7 3.5 5.4 5.4 4.4 6.7 4.7 4.4 3.3 3.5 2.5 2.6 2.5 2.5 3.3 4.5 5.1 4.8 7.7 6.2 6.7 8.5 6.0 10.9 7.9 7.3 3.6 4.0 2.8 2.7 2.7 4.6 2.4 2.1 1.6 2.1 1.6 1.6 1.6 1.4 1.5 1.9 3.4 2.9 3.3 3.2 3.7 5.2 2.5 7.7 4.1 5.2 2.5 1.1 This page intentionally left blank Notes All data shown in the appendices were run using TRIM calculations from SRIM 2003, using detailed calucation with full damage cascades, and 100 ions SRIM 2003 was used with permission from James Ziegler This page intentionally left blank Index AES 51, 203, 227, 269, 270, 272, 279, 301, 302, 304, 305, 309, 310, 312, 313, 314, 315, 316, 317, 318, 324, 325 amorphization 13, 46, 48, 49, 52, 220 amorphous 13, 16, 22, 43, 46, 59, 76, 78, 79, 175, 179, 180, 182, 183, 187, 215, 310, 315 artifacts 14, 35, 44, 48, 49, 50, 70, 128, 129, 143, 148, 149, 154, 156, 159, 160, 162, 167, 173, 176, 177, 179, 181, 182, 187, 189, 196, 202, 206, 209, 214, 220, 224, 301, 302, 305 aspect ratio 31, 32, 50, 63, 65, 85, 102, 276 atom probe 84, 282 Auger viii, 1, 203, 205, 269, 288, 301, 302, 303, 304, 305, 306, 308, 309, 312, 313, 314, 315, 316, 317, 318, 319, 320, 321, 322, 323, 324, 325, 326, 327 Backsputtering 30 biological xiii, 148, 149, 169, 218, 255, 269, 273, 275, 285, 286 CAD 73, 82, 83, 89, 94, 100, 101 CE-FIBM 64, 65, 66, 67, 69 channeling 13, 19, 22, 43, 44, 45, 46, 67, 75, 130, 141, 144, 145,161, 162, 164, 165, 169, 170, 258, 259, 297 charging 8, 9, 14, 88, 109, 122, 126, 128, 135, 141, 202, 215, 257, 317 Clean up 103 collision cascade 8, 13, 19, 22, 35, 37, 43, 46, 47, 69, 270 CrossBeam 134, 135, 138, 141 cross-section xiii, 16, 107, 109, 111, 116, 117, 120, 123, 125, 126, 128, 150, 151, 161, 164, 165, 167, 169, 205, 214, 215, 247, 249, 253, 255, 256, 265, 266, 305, 310, 312, 319, 321, 324, 325 cryo 247, 255 curtaining 161, 202, 220, 221, 222 CVD 9, 12, 14, 73, 76, 78, 82, 84, 85, 155, 157, 205, 213, 214, 218, 222, 226 damage 13, 22, 23, 38, 40, 43, 46, 47, 48, 50, 67, 87, 90, 98, 107, 112, 113, 114, 118, 122, 125, 126, 148, 149, 151, 152, 153, 159, 162, 164, 168, 182, 187, 205, 207, 209, 212, 219, 220, 221, 224, 256, 261, 262, 290, 298, 302, 311, 315, 316, 317, 320, 321, 353 deposition xiv, 1, 7, 9, 11, 12, 53, 54, 55, 57, 58, 59, 61, 71, 73,76,77, 78, 81, 82, 86, 88, 90, 100, 101, 102, 103, 104, 121, 133, 134, 144, 154, 165, Index 356 166, 167, 178, 183, 205, 221, 222, 229, 231, 233, 234, 235, 237, 260, 261, 263, 277, 288, 317, 319, 321, 325 detector 7, 8, 11, 142, 145, 164, 196, 250, 262, 282, 284, 285, 314 device edit 87, 88, 121,122, 130 dose 25, 26, 27, 56, 59, 64, 161, 162, 163, 165, 166, 260 dual beam 69, 107, 111, 119, 121, 123, 126, 131, 147, 157, 202, 206, 247, 248, 249, 250, 254, 255, 256, 258, 261, 262, 263, 265, 266, 267, 315, 318, 322, 325 EBSD 11, 12, 247, 254 enhanced etch 53, 55, 69, 101, 102, 104 EXLO 201, 203, 205, 207, 208, 209, 210, 211, 212, 213, 214, 215, 217, 218, 219, 222, 224 FIB dimpling 193, 195 FIB image 8, 10, 43, 45, 166, 177, 207, 213, 215, 217, 221, 222, 223, 258, 259, 289 GAE 144, 149 halogen 9, 65, 67, 130 Implantation 25, 52, 128 INLO 201, 213, 214, 215, 219, 220, 221, 222, 224 Ion Range viii, ix, 16, 337, 341, 345, 349 lift-out 48, 169, 170, 171, 173, 174, 179, 180, 181, 182, 198, 201, 202, 203, 204, 210, 221, 230, 244, 264 liquid metal ion source 1, 3, 4, 12, 134, 137, 143, 272, 297 LMIS 1, 3,4,5, 12, 134, 138 MEMS 107, 123, 125, 126, 131, 132 metrology 133, 247, 264, 265, 267 micromachining 53, 55, 56, 57, 58, 61, 63, 64, 65, 66, 70, 71, 147, 171 micro-sampling 205, 212, 213, 228, 229, 230, 231, 232, 235, 236, 237, 244 milling xiv, 7, 8, 9, 11, 14, 22, 27, 31, 32, 33, 38, 40, 41, 42, 43, 47, 49, 50, 85, 87, 91, 101, 102, 107, 116, 128, 129, 130, 135, 139, 140, 141, 142, 144, 147, 149, 160, 161, 162, 163, 165, 168, 169, 170, 171, 174, 179, 180, 181, 182, 183, 187, 189, 190, 193, 199, 200, 201, 202, 203, 205, 206, 207, 209, 212, 213, 220, 221, 222, 224, 229, 230, 231, 233, 236, 237, 239, 241, 242, 244, 247, 248, 249, 250, 263, 266, 267, 286, 287, 315 modifications 50, 87, 88, 94, 103, 106, 121, 133, 139, 141,276 nanofabrication 73, 74, 76, 78, 79, 84, 85, 247, 260, 267 organometallic plan view 190, 205, 212, 215, 217, 229, 235, 236, 237, 238 Pt 9, 59, 61, 88, 94, 103, 104, 112, 122, 178, 180, 183, 204, 205, 206, 221, 222, 231, 233, 257, 331, 335, 339, 343, 347, 351 reconstruction 157, 158, 159, 181, 253, 277, 281, 282, 284, 287, 288, 291, 292, 293, 295, 296, 297, 301, 322, 323 redeposition 13, 30, 31, 32, 33, 34, 41, 43,48,49,50,63,65,70,102, 103, 163, 206, 209, 214, 224 secondary electron 7, 8, 14, 43, 44, 75, 153, 250, 258, 259, 260, 283, 296, 305, 312, 316 secondary ion 7, 14, 145, 270, 271, 277, 283 SEM viii, 1, 3,8,9, 11, 12, 32, 40, 41, 59, 69, 75, 133, 134, 135, 137, 138, 139, 140, 141, 142, 144, 145, 147, 148, 149, 152, 162, 173, 174, 176, 177, 180, 183, 190, 199, 203, 205, 206, 207, 219, 227, 234, 239, 240, 241, 242, 243, 247, 248, 249, 250, 255, 256, 258, 259, 262, 263, 265, 266, 268, 285, 315, 316, 317, 319, 320, 321, 322, 323, 324, 325, 326 Index serial sectioning 153, 157, 158, 285, 287 SIMS viii, xv, 11, 13, 133, 134, 145, 147, 148, 157, 159, 168, 171, 203, 205, 227, 269, 270, 271, 272, 273, 274, 275, 276, 277, 278, 279, 280, 283, 286, 288, 289, 290, 291, 292, 294, 295, 297, 298, 300 slice and view 250 specimen preparation xiii, xv, 11, 38, 50, 59, 75, 147, 148, 149, 150, 152, 155, 156, 159, 160, 162, 163, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 178, 180, 190, 192, 198, 201, 202, 206, 208, 212, 213, 214, 215, 220, 222, 223, 224, 228, 229, 235, 239, 240, 244, 245, 276 sputtering 1,3, 7, 9, 11,13, 15, 16,19, 22, 23, 26, 27, 28, 30, 31, 32, 33, 34, 35, 37, 38, 39, 40, 41, 42, 43, 45, 46, 49, 50, 53, 55, 56, 58, 63, 65, 66, 67, 70, 145, 157, 159, 165, 166, 168, 169, 170, 206, 220, 270, 272, 276, 277, 278, 282, 286, 288, 289, 290, 298, 315, 326 STEM 57, 59, 219, 220, 227, 229, 231, 239, 240, 241, 242, 243, 262, 263 stopping power 16, 21, 23, 24, 25, 35, 37, 43,50 Striations See curtaining TEM viii, xiii, xv, 17, 28, 31, 38, 47, 49, 50, 57, 59, 73, 133, 134, 147, 148, 150, 152, 153, 155, 156, 159, 162, 163, 165, 167, 168, 169, 170, 171, 173, 174, 175, 176, 177, 178, 179, 180, 181, 183, 185, 190, 191, 192, 195, 198, 199, 200, 201, 202, 203, 357 204, 205, 207, 208, 209, 210, 211, 212, 213, 214, 215, 216, 217, 218, 219, 220, 221, 222, 223, 224, 225, 226, 227, 228, 229, 230, 231, 234, 235, 236, 237, 238, 239, 240, 244, 245, 247, 248, 253, 261, 262, 263, 264, 272, 276, 285, 310, 315 TEM specimen preparation xiii, 38, 156, 162, 163, 169, 170, 173, 176, 177, 208, 215, 223, 228, 229, 239, 240, 244, 245 three dimension 11, 61, 133, 157, 159, 174, 276, 282, 283, 284, 295 Tomography 157, 158, 284 TRIM 22, 23, 24, 27, 29, 30, 35, 36, 38, 39, 40, 42 tripod polishing 175, 176, 183, 186, 187, 188, 190, 193 V Shape 33, 34 voltage contrast 8, 107, 109, 139, 140, 258, 259, 267 W vii, viii, xi, 3, 5, 9, 13, 43, 51, 52, 58, 59,61,65,67,76,77,88,131,132, 143, 153, 167, 168, 169, 170, 171, 178, 180, 183, 186, 187, 199, 201, 202, 204, 205, 215, 217, 218, 225, 226, 227, 228, 231, 233, 234, 235, 244, 268, 279, 280, 299, 300, 308, 311, 331, 335, 339, 343, 347, 351 waterfall See curtaining XEDS 49, 219, 302, 304, 316, 318, 319, 321, 322, 323, 324, 325, 326 ... attest to the accuracy and integrity of this document Date: 2005. 07.01 19:20:13 +08'00' INTRODUCTION TO FOCUSED ION BEAMS Instrumentation, Theory, Techniques and Practice This page intentionally... left blank INTRODUCTION TO FOCUSED ION BEAMS Instrumentation, Theory, Techniques and Practice Edited by Lucille A Giannuzzi FEI Company Fred A Stevie North Carolina State University Springer eBook... KEMPSHALL 13 Focused Ion Beam Gases for Deposition and Enhanced Etch F A STEVIE, D P GRIFFIS, AND P E RUSSELL 53 Three-Dimensional Nanofabrication Using Focused Ion Beams T KAITO 73 Device Edits and Modifications

Ngày đăng: 11/05/2018, 15:45

TÀI LIỆU CÙNG NGƯỜI DÙNG

TÀI LIỆU LIÊN QUAN