High mobility III v compound semiconductors for advanced transistor applications

High mobility III v compound semiconductors for advanced transistor applications

High mobility III v compound semiconductors for advanced transistor applications

... never be forgotten Thank you for your love and devotion ii High Mobility III- V Compound Semiconductors For Advanced Transistor Applications Acknowledgements i Table of Contents iii Abstract vi ... s V Voltage V Vbase Base voltage of trapezoidal pulse V VDS or VD Drain voltage V VFB Flatband voltage V VGS or VG Gate voltage V VT Threshold voltage V vth The...

Ngày tải lên: 11/09/2015, 10:01

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Self aligned source and drain contact engineering for high mobility III v transistor

Self aligned source and drain contact engineering for high mobility III v transistor

... thickness nm Tox Equivalent oxide thickness nm VFB Flatband voltage V Gate voltage V Threshold voltage V RIII -V RNi-InGaAs VG VT or VT' ' xxiii ∆VT Threshold voltage shift V W Contact width μm Weff ... Abstract Self- Aligned Source and Drain Contact Engineering For High Mobility III- V Transistor by ZHANG Xin Gui Doctor of Philosophy – Electrical and Comp...

Ngày tải lên: 09/09/2015, 10:14

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Development of high mobility channel layer formation technology for high speed CMOS devices

Development of high mobility channel layer formation technology for high speed CMOS devices

... DEVELOPMENT OF HIGH MOBILITY CHANNEL LAYER FORMATION TECHNOLOGY FOR HIGH SPEED CMOS DEVICES OH Hoon Jung (B Sc., Ewha Womans University, Korea) ... the use of new gate stack materials Thus this work of development of high mobility channel layer formation technology has been carried out for the innovative change The subsequent sections in ... pro...

Ngày tải lên: 11/09/2015, 10:00

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Tài liệu Megabit Modems 410F/420F ADSL Modem Pair for Advanced LAN Applications pdf

Tài liệu Megabit Modems 410F/420F ADSL Modem Pair for Advanced LAN Applications pdf

... Ordering Information Dimensions (H x W x D) Description Catalog Number Megabit Modem 410F 1.2 x 6.9 x 9.2 in (3.1 x 17.5 x 23.4 cm) MM410F-x* Megabit Modem 420F 1.2 x 6.9 x 9.2 ... power supply for European use, UK/Ireland power cord SPECIFICATIONS Physical Specifications Weight: 2.2 lbs (1.0 kg) Power LAN: Link, Tx, Rx, Collision ADSL: Sync, Tx, Rx, Margin LAN Interface: ... di...

Ngày tải lên: 17/01/2014, 10:20

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Strain engineering for advanced transistor structure

Strain engineering for advanced transistor structure

... STRAIN ENGINEERING FOR ADVANCED TRANSISTOR STRUCTURE TAN KIAN MING (B ENG (HONS.)), NUS (M ENG.), NUS A THESIS SUBMITTED FOR THE DEGREE OF DOCTOR OF PHILOSOPHY ... can induce strain in the transistor channel [2.2], and the localized strain could be exploited to enhance the performance of aggressively scaled transistors While many approaches to strained-Si ... to investigat...

Ngày tải lên: 14/09/2015, 14:13

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Advanced transistors for supply voltage reduction tunneling field effect transistors and high mobility MOSFETS

Advanced transistors for supply voltage reduction tunneling field effect transistors and high mobility MOSFETS

... ADVANCED TRANSISTORS FOR SUPPLY VOLTAGE REDUCTION: TUNNELING FIELD- EFFECT TRANSISTORS AND HIGH- MOBILITY MOSFETS GUO PENGFEI (B ENG (HONS.)), NUS A THESIS SUBMITTED FOR THE DEGREE ... tr Rise time s V Voltage V Va Voltage amplitude V Vbase Base level voltage V VDD Supply voltage V VDS Drain voltage V VFB Flatband voltage V VGS V VTH Gate voltage Max...

Ngày tải lên: 10/09/2015, 09:01

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Contact and source drain engineering for advanced III v field effect transistors

Contact and source drain engineering for advanced III v field effect transistors

... Abstract Contact and Source/ Drain Engineering for Advanced III- V Field- Effect Transistors By Kong Yu Jin, Eugene Doctor of Philosophy – Electrical and Computer Engineering National University ... metallization V Voltage Vd Voltage or bias applied to the drain of a MOSFET Vdd Supply voltage Vg Voltage or bias applied to the gate of a MOSFET Vt,sat Saturation thr...

Ngày tải lên: 30/09/2015, 05:43

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Novel III v mosfet integrated with high k dielectric and metal gate for future CMOS technology

Novel III v mosfet integrated with high k dielectric and metal gate for future CMOS technology

... NOVEL III- V MOSFET INTEGRATED WITH HIGH- K DIELECTRIC AND METAL GATE FOR FUTURE CMOS TECHNOLOGY Jianqiang Lin 2009 NOVEL III- V MOSFET INTEGRATED WITH HIGH- K DIELECTRIC AND METAL GATE FOR FUTURE ... 2006 [1.38] I Ok, H Kim, M Zhang, T Lee, F Zhu, L Yu, S Koveshnikov, W Tsai1 ,V Tokranov, M Yakimov, S Oktyabrsky, and J.C Lee “Self-Al...

Ngày tải lên: 16/10/2015, 15:37

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Improving Recapitalization Planning - Toward a Fleet Management Model for the High-Mobility Multipurpose Wheeled Vehicle ppt

Improving Recapitalization Planning - Toward a Fleet Management Model for the High-Mobility Multipurpose Wheeled Vehicle ppt

... become available, it may be advantageous to adopt a panel-data approach 8 Improving Recapitalization Planning: Toward a Fleet Managemen Model for the HMMWV Age We calculated vehicle age by subtracting ... 30 Improving Recapitalization Planning: Toward a Fleet Management Model for the HMMWV Table 4.1 Fleet Management Model Assumptions in Sensitiv...

Ngày tải lên: 15/03/2014, 21:20

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ADAS for the Car of the Future - Interface Concepts for Advanced Driver Assistant Systems in a Sustainable Mobility Concept of 2020 pptx

ADAS for the Car of the Future - Interface Concepts for Advanced Driver Assistant Systems in a Sustainable Mobility Concept of 2020 pptx

... J.P. Thalen – April/June 2006 – University of Twente ADAS Interface Design Abstract Abstract ADAS For the Car of the Future Interface Concepts for Advanced Driver Assistant Systems in a Sustainable Mobility Concept of 2020 Background ­ Intelligent Vehicle Systems offer great potential to future  mobility. An increase of intelligent in­vehicle  ... ADAS Interface Design Report title:  ADAS ...

Ngày tải lên: 23/03/2014, 10:20

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Báo cáo hóa học: " Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application" pdf

Báo cáo hóa học: " Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application" pdf

... images of the resist and HfO2 patterns Plan view images of (a) the resist pattern after laser interference nanolithography and (b) the resulting HfO2 nanopattern after CF4/ O2 ICP-RIE and HCl/H2O ... passivation during HfO2 selective etching and wet cleaning with an HCl/H2O solution results in the formation of tapered HfO2 etch profiles Optimisation of the...

Ngày tải lên: 21/06/2014, 03:20

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Báo cáo hóa học: " Study of the vertical transport in p-doped superlattices based on group III-V semiconductors" pdf

Báo cáo hóa học: " Study of the vertical transport in p-doped superlattices based on group III-V semiconductors" pdf

... quasi-classical transport theory based on Boltzmann’s equation with the collision integral taken within the relaxation time approximation, the conductivity for vertical transport in SL minibands at ... considered at the top of the Coulomb potential at the barrier Horizontal dashed lines indicate the bottom of the first miniband and the top of the second m...

Ngày tải lên: 21/06/2014, 05:20

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Báo cáo sinh học: " Research Article Time-Frequency Based Channel Estimation for High-Mobility OFDM Systems—Part II: Cooperative Relaying Case" pptx

Báo cáo sinh học: " Research Article Time-Frequency Based Channel Estimation for High-Mobility OFDM Systems—Part II: Cooperative Relaying Case" pptx

... timevarying CO -OFDM channels (S → R), (R → D) as well as the cascaded (S → R → D) channels We approach the channel estimation problem from a time-frequency point of view and employ the channel estimation ... almost the same estimation performance for −40 and 40 dB and obtain better results for GSR /GRD = dB as in the individual channel estimation case We show the BER per...

Ngày tải lên: 21/06/2014, 16:20

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Study on high mobility channel transistors for future sub 10 nm CMOS technology

Study on high mobility channel transistors for future sub 10 nm CMOS technology

... STUDY ON HIGH MOBILITY CHANNEL TRANSISTORS FOR FUTURE SUB- 10 nm CMOS TECHNOLOGY Fei GAO (B Eng, Xi’an Jiaotong University, PR CHINA) A THESIS SUBMITTED FOR THE DEGREE OF DOCTOR ... strained high- Ge concentration SGOI is successfully demonstrated by two-step oxidation of sputtered low Ge content α-SiGe (amorphous SiGe) on a SOI substrate Compared with convention...

Ngày tải lên: 12/09/2015, 08:16

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Extending si CMOS ingaas and gesn high mobility channel transistors for future high speed and low power applications

Extending si CMOS ingaas and gesn high mobility channel transistors for future high speed and low power applications

... EXTENDING SI CMOS: INGAAS AND GESN HIGH MOBILITY CHANNEL TRANSISTORS FOR FUTURE HIGH SPEED AND LOW POWER APPLICATIONS GONG XIAO A THESIS SUBMITTED FOR THE DEGREE OF DOCTOR ... Summary Extending Si CMOS: InGaAs and GeSn High Mobilty Channel Transistors for Future High Speed and Low Power Logic Application by GONG Xiao Doctor o...

Ngày tải lên: 12/09/2015, 11:24

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