Coatings Technology Handbook Episode 1 Part 10 pptx

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Coatings Technology Handbook Episode 1 Part 10 pptx

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31-30 Coatings Technology Handbook, Third Edition 42. A. Etspuler and H. Suhr, J. Appl. Phys., A48, 373 (1989). 43. E. Feurer, S. Kraus, and H. Suhr, J. Vac. Sci. Technol., A7, 2799 (1989). 44. H. Holzschuh and H. Suhr, J. Appl. Phys., A51, 486 (1990). 45. H. Holzschuh and H. Suhr, Appl. Phys. Lett., 59, 470 (1991). 46. M. D. Hudson, C. Trundle, and C. J. Brierly, J. Mater. Res., 3, 1151 (1988). 47. R. A. Kant and G. K. Huber, Surf. and Coat. Technol., 51, 247 (1992). 48. R. Prange, R. Cremer, D. Neuschutz, Surf. and Coat. Technol, 133–134, 208–214 (2000). 49. E. Kubel, Metall. Powder Rep., 43, 832 (1988). 50. B. Leon, A. Klumpp, M. Perez-Amor, and H, Sigmund, Appl. Surf. Sci., 46, 210 (1990). 51. Y. S. Liu, in Tungsten and Other Refractory Metals for VLSI Applications. R. L. Blewer, Ed., Mater. Res. Soc. Proc., 43 (1985). 52. C. Mitterez, M. Rauter, and P. Rodhammer, Surf. and Coat. Technol., 41, 351 (1990). 53. S. Motojima and H. Mizutani, Appl. Phys. Lett., 54, 1104 (1989). 54. A. Chayahara, H. Yokoyama, T. Imura, and Y. Osaka, Appl. Surf. Sci., 33/34, 561 (1988). 55. C. Oehr and H. Suhr, J. Appl. Phys., A49, 691 (1989). 56. D. Hofmann, S. Kunkel, H. Schussler, G. Teschner, R. Gruen, Surf. and Coat. Technol, 81, 146–150 (1996). 57. R. D. Arnell, Surf. and Coat. Technol., 43/44, 674 (1990). 58. E. Bergmann, E. Moll, in Plasma Surface Engineering, Vol. 1. E. Broszeit, W. Muenz, H. Oechsner, G. Wolf, Eds, Heidelberg: DGM-Verlag, Oberursel, 1989, p. 547. DK4036_C031.fm Page 30 Thursday, May 12, 2005 9:40 AM © 2006 by Taylor & Francis Group, LLC 32 -1 32 Cathodic Arc Plasma Deposition 32.1 Introduction 32- 1 32.2 Cathodic Arc Plasma Deposition Process 32- 1 32.3 Cathodic Arc Sources 32- 3 32.4 Cathodic Arc Emission Characteristics 32- 3 32.5 Microdroplets 32- 4 32.6 Recent Developments 32- 5 References 32- 7 32.1 Introduction The cathodic arc plasma deposition (CAPD) method 1,2 of thin film deposition belongs to a family of ion plating processes that includes evaporative ion plating 3,4 and sputter ion plating. 5,6 However, the CAPD process involves deposition species that are highly ionized and posses higher ion energies than other ion plating processes. All the ion plating processes have been developed to take advantage of the special process development features and to meet particular requirements for coatings, such as good adhesion, wear resistance, corrosion resistance, and decorative properties. The cathodic arc technique, having proved to be extremely successful in cutting tool applications, is now finding much wider ranging applications in the deposition of erosion resistance, corrosion resistance, decorative coatings, and architectural and solar coatings. 32.2 Cathodic Arc Plasma Deposition Process In the CAPD process, material is evaporated by the action of one or more vacuum arcs, the source chamber, a cathode and an arc power supply, an arc ignitor, an anode, and substrate bias power supply. Arcs are sustained by voltages in the range of 15 to 50 V, depending on the source material; typical arc currents in the range of 30 to 400 A are employed. When high currents are used, an arc spot splits into multiple spots on the cathode surface, the number depending on the cathode material. This is illustrated spots move randomly on the surface of the cathode, typically at speeds of the order of tens of meters per second. The arc spot motion and speed can be further influenced by external means such as magnetic fields, gas pressures during coatings, and electrostatic fields. Materials removal from the source occurs as a series of rapid flash evaporation events as the arc spot migrates over the cathode surface. Arc spots, which are sustained as a result of the material plasma generated by the arc itself, can be controlled with appropriate boundary shields and/or magnetic fields. H. Randhawa Vac-Tec Systems, Inc. DK4036_book.fm Page 1 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC material being the cathode in the arc circuit (Figure 32.1). The basic coating system consists of a vacuum in Figure 32.2 for a titanium source. In this case, an average arc current/arc spot is about 75 A. The arc 32 -6 Coatings Technology Handbook, Third Edition FIGURE 32.5 Microdroplet emission from metals having different melting points. FIGURE 32.6 Scanning electron micrographs showing surface topography of various films using modified arc technology. Cu Ta Cr 1.50 kv 30 kv 002 30 kv 0141.00 kv TiN ZrN TiO 2 1.50 kv 30 kv 003 DK4036_book.fm Page 6 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC 33 -1 33 Industrial Diamond and Diamondlike Films 33.1 Introduction 33- 1 33.2 Diamond and Diamondlike Films 33- 1 33.3 Film Deposition Techniques 33- 2 33.4 Diamond and Diamondlike Film Properties 33- 3 33.5 Potential Applications 33- 4 33.1 Introduction The mechanical, electrical, thermal, and optical properties of diamond make it attractive for use in a variety of different applications ranging from wear-resistant coatings for tools and engineered compo- nents to advanced semiconductor structures for integrated circuit devices. 1 Until recently, diamond “coating” was done by bonding single-crystal diamond grits to the surfaces of the components to be coated. Applications for diamond coatings were limited, therefore, to tooling used for cutting and grinding operations. Recent advancements in plasma-assisted chemical vapor deposition (PACVD) and ion beam enhanced deposition technologies make it possible to form continuous diamond and diamondlike carbon films on component surfaces. There new films have many of the mechanical, thermal, optical, and electrical properties of single-crystal diamond, and they make possible the diamond facing of precision tools and wear parts, optical lenses and components, and computer disks, as well as the production of advanced semiconductor devices. The most flexibility, in terms of properties of the deposited diamond films and types of material coatable, is found when the films are formed using ion beam deposition techniques. 33.2 Diamond and Diamondlike Films The ability to diamond-coat tools and engineered components required that diamond precursor material be condensed from a vapor phase as a continuous film onto the surface of the component to be coated. Furthermore, the deposition must proceed so that the vapor-deposited material condenses with the structure and morphology of diamond. Diamond is a metastable form of carbon; as such, when con- densed from a vapor or from a flux of energetic particles, it will tend to assume its most thermodynam- ically stable state or form — graphite. With advanced processes like chemical vapor deposition (CVD) and ion beam enhanced deposition, it is possible to influence, to a certain degree, the energy and charge states of the particles in the vapor phase, thus allowing some control over the energy state (stable or metastable) and crystallographic and stoichiometric form of the deposited films. Thus, it is feasible to Arnold H. Deutchman BeamAlloy Corporation Robert J. Partyka BeamAlloy Corporation DK4036_book.fm Page 1 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC Plasma-Assisted Chemical Vapor Deposition (PACVD) References 33-5 Te c hniques • Ion Beam Enhanced Deposition (DIOND) 33 -6 Coatings Technology Handbook, Third Edition 17. O. Matsumoto et al., Thin Solid Films, 146 , 283 (1986). 18. N. Fujimori et al., Vacuum, 36 , 99 (1986). 19. S. Aisenberg et al., J. Appl. Phys., 42 , 2953 (1976). 20. E. G. Spenser et al., Appl. Phys. Lett., 29 , 228 (1976). 21. J. H. Freeman et al., Nuclear Instrum. Methods, 135 , 1 (1976). 22. T. Miyazawa et al., J. Appl. Phys., 55 , 188 (1984). 23. J. W. Rabalais et al., Science, 239 , 623 (1988). 24. C. Weissmantel, Thin Solid Films, 92 , 55 (1982). 25. M. J. Mirtich et al., Thin Solid Films, 131 , 245 (1985). 26. C. Weissmantel et al., J. Vac. Sci. Technol. A4, 6 , 2892 (1985). 27. A. H. Deutchman et al., Ind. Heating, LV(7), 12 (1988). DK4036_book.fm Page 6 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC 34 -1 34 Tribological Synergistic Coatings 34.1 34.2 What Are Synergistic Coatings? 34- 2 34.3 Wear Testing 34- 3 34.4 Coating Families 34- 3 34.1 Introduction The solution of wear and many related problems for any application is very much experience dependent. A scientific basis for resolving these problems unfortunately has not yet been found. Using experience and history, it is possible to recommend a number of potential solutions; however, the ultimate proof is in the actual trial of the application. This is because there are so many variables within each application that the slightest change could make a difference in the selection of the appropriate coating. Even though applications appear to be identical, there are always slight differences such that the same coating selection will not always perform in the same manner. The production of synergistic coatings on steel (Nedox) or aluminum (Tufram) is based on the principle of infusion of a dry lubricant or polymer into the coatings. General Magnaplate has developed a family of such coatings (Nedox), each one representing specific properties, such as hardness, lubricity, corrosion protection, and dielectric strength. The standard hardfacing for steel is an electroless nickel coating. There are a number of electroless nickels that vary the phosphorus content and consequently have differences in hardness and corrosion resistance. Choice of such a coating varies and is based on the application requirements. Synergistic coatings for aluminum (Tufram) have been used successfully for many years. The system can accommodate almost all aluminum alloys, provided a copper content of 5% and a silicon content of 7% are not exceeded. Higher percentages of these constituents (set up too great a change in substrate resistivity, hence) prevent the buildup of required film thickness. The prime purpose of the Tufram system is to produce films having properties such as improved wear resistance, better surface release (lower coefficient of friction), good corrosion resistance, and high dielectric strength. The principle of these coatings is based on a hardcoat after which a polymer or dry lubricant is infused into the coating substrate. All coatings are used in a wide variety of industries. Some are in compliance with the regulations of the U.S. Food and Drug Administration and can be used in food and medical applications. Walter Alina General Magnaplate Corporation DK4036_book.fm Page 1 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC Polymer Coatings (Lectrofluor) • Magnesium (Magnadize) and Introduction 34-1 Titanium (Canadize) • Titanium Nitride (Magnagold) Tribological Synergistic Coatings 34 -5 TA BLE 34.1 Friction Data by Materials Upper Plate a Lower Plate a Coefficients of Friction Static Kinetic IceIce 0.000 0.000 Hi-T-Lube Hi-T-Lube 0.251 0.217 Hi-T-Lube Steel 0.056 0.049 Hi-T-Lube b Hi-T-Lube b 0.034 0.034 Lectrofluor 604 Glass 0.190 0.172 Lectrofluor 604P Teflon 0.106 0.089 Magnagold Magnagold 0.245 0.211 Magnagold Magnagold + Ni 0.484 0.357 Magnagold Teflon 0.150 0.123 Magnagold Steel 0.300 0.246 Magnagold Nickel 0.326 0.259 Magnagold Glass 0.177 0.155 Magnagold Aluminum 0.248 0.220 Magnagold Chromium a 0.193 0.174 Magnagold Steel 0.313 0.285 Magnagold Nickel 0.367 0.329 Magnagold Titanium P 0.559 0.494 Magnagold Copier paper 0.518 0.497 Magnagold MOS/2 0.304 0.270 Magnagold Hi-T-Lube 0.264 0.244 Magnagold Graphite over paper 0.260 0.234 Magnaplate TFE Magnagold + TFE 0.225 0.174 Magnaplate HCR Magnaplate HCR 0.198 0.174 Magnaplate HCR Glass 0.138 0.125 Magnaplate HCR Aluminum 0.346 0.289 Magnaplate HCR Teflon 0.142 0.120 Magnaplate HMF Hi-T-Lube b 0.032 0.031 Magnaplate HMF Magnaplate HMF 0.160 0.147 Magnaplate HMF Teflon 0.059 0.053 Magnaplate HMF Glass 0.251 0.192 Magnaplate HMF Steel 0.212 0.181 Nedox S/F 2 Steel 0.301 0.260 Nedox S/F 2 Teflon 0.103 0.090 Nedox S/F 2 Nedox S/F 2 0.179 0.123 Nedox S/F 2 Glass 0.137 0.130 Tufram 604 Aluminum 0.429 0.371 Tufram H–2 Tufram H–2 0.171 0.139 Tufram H–2 Glass 0.203 0.169 Tufram H–2 Aluminum 0.377 0.264 Tufram H–2 Teflon 0.134 0.120 Tufram H–0 Tufram H–0 0.249 0.223 Tufram H–0 Glass 0.180 0.150 Tufram H–0 Aluminum 0.251 0.219 Tufram H–0 Teflon 0.121 0.103 Tufram L–4 Tufram L–4 0.184 0.173 Tufram L–4 Aluminum 0.353 0.294 Tufram L–4 Glass 0.256 0.189 Tufram L–4 Teflon 0.142 0.130 Tufram R66 Glass 0.162 0.149 Tufram R66 Tufram R66 0.148 0.115 Tufram R66 Aluminum 0.329 0.272 Tufram R66 Teflon 0.133 0.100 Aluminum Titanium A 0.413 0.376 Aluminum Titanium P 0.614 0.531 Aluminum Teflon 0.237 0.186 Aluminum Glass 0.175 0.137 DK4036_book.fm Page 5 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC 34 -6 Coatings Technology Handbook, Third Edition Aluminum Aluminum 0.646 0.563 Aluminum Magnagold 0.304 0.263 Aluminum Chromium 0.199 0.185 Aluminum Nickel 0.258 0.233 Aluminum Steel 0.466 0.375 Chromium Chromium A 0.176 0.159 Chromium Aluminum 0.266 0.216 Chromium Magnagold 0.176 0.149 Chromium Nickel 0.405 0.356 Chromium Steel 0.254 0.210 Copier paper Copier paper 0.275 0.259 Graphite over paper Graphite over paper 0.322 0.302 Hard chromium Titanium P 0.344 0.304 Hard chromium Teflon 0.095 0.078 Hardcoated aluminum Glass 0.151 0.127 Hardcoated aluminum Teflon 0.178 0.157 Hardcoated aluminum Hardcoated aluminum 0.264 0.220 MOS/2 MOS/2 0.433 0.418 Nickel Teflon 0.148 0.120 Nickel Chromium 0.192 0.174 Nickel Aluminum 0.330 0.253 Nickel Magnagold 0.308 0.267 Nickel Nickel 0.317 0.279 Steel Titanium P 0.493 0.410 Steel Hi-T-Lube 0.254 0.218 Steel Graphite over paper 0.245 0.225 Steel Aluminum 0.349 0.247 Steel Magnagold 0.377 0.308 Steel Magnagold + Ni 0.675 0.607 Steel Teflon 0.269 0.269 Steel Nickel 0.723 0.553 Steel Glass 0.127 0.116 Steel Chromium 0.202 0.174 Steel Nickel 0.431 0.333 Steel Magnagold 0.218 0.194 Steel Nickel 0.353 0.315 Steel Steel 0.423 0.351 Te flon Titanium A 0.232 0.205 Te flon Titanium P 0.291 0.240 Te flon Hard chromium 0.210 0.191 Te flon Magnagold + Ni 0.209 0.160 Te flon Magnagold 0.161 0.114 Te flon Magnaplate HCR 0.178 0.167 Te flon Magnaplate HMF 0.172 0.154 Te flon Nedox SF2 0.149 0.120 Te flon Tufram H–2 0.137 0.127 Te flon Tufram H0 0.167 0.138 Te flon Tufram L4 0.149 0.131 Te flon Tufram R66 0.180 0.149 Te flon Teflon 0.083 0.070 Te flon Steel 0.184 0.157 Te flon Nickel 0.223 0.190 Te flon Hardcoated aluminum 0.207 0.183 Te flon Glass 0.097 0.097 Te flon Aluminum 0.194 0.177 Titanium A Steel 0.358 0.317 TA BLE 34.1 Friction Data by Materials (Continued) Upper Plate a Lower Plate a Coefficients of Friction Static Kinetic DK4036_book.fm Page 6 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC Tribological Synergistic Coatings 34 -7 Titanium A Magnagold 0.264 0.226 Titanium A Hard chromium 0.375 0.332 Titanium A Aluminum 0.345 0.288 Titanium P Steel 0.369 0.283 Titanium P Magnagold 0.290 0.258 Titanium P Hard chromium 0.328 0.288 Titanium P Alumium 0.430 0.321 Titanium A Titanium A 0.359 0.303 Titanium A Teflon 0.174 0.142 Titanium P Titanium A 0.415 0.370 Titanium P Teflon 0.223 0.193 a A superscript “a” indicates additional polish after coating; a “b” indicates postburnishing — comparable to breaking in the surface. TA BLE 34.2 Designation in Ta ble 34.1 Description Aluminum 6061 T6 grade (0.250) thickness Steel 1032 grade H32 (0.250) thickness Titanium A 6A1/4V (0.250) thickness Titanium P Vacuum deposited at 10 to 5 torr, 2 µ m thickness, purity 99.99% Glass Tempered (0.250) thickness Te flon White, virgin grade (0.250) thickness Nickel Autocatalytic 6/8% phosphorus (0.001) Hard chromium Industrial grade (0.0003) Hard anodize 6061 T6 (0.002) Tufram Proprietary aluminum coating Nedox Proprietary treatment for steel and stainless steels and nonferrous metals Hi-T-Lube Proprietary solid film metal alloy lubricant Magnagold Proprietary method for vacuum coating of titanium nitride Magnaplate HMF Proprietary ultrahard, high microfinish for most base metals Magnaplate HCR Proprietary ultrahard and exceptionally corrosion-resistant coating for aluminum FIGURE 34.2 T.M.I. slip and friction tester. TA BLE 34.1 Friction Data by Materials (Continued) Upper Plate a Lower Plate a Coefficients of Friction Static Kinetic DK4036_book.fm Page 7 Monday, April 25, 2005 12:18 PM © 2006 by Taylor & Francis Group, LLC Key to Materials and Coatings Listed in Table 34.1 [...]... Group, LLC DK4036_book.fm Page 10 Monday, April 25, 2005 12 :18 PM 34 -10 Coatings Technology Handbook, Third Edition TABLE 34.4 Wettability of Various Metal Surfaces Wettability Metal Contact 18 0° 12 6° 14 8° 13 6° 14 7° 13 5° 13 9° 10 2° 14 0° 14 7° 10 0° 13 2° 10 4° ~70° 11 0° Cu Al Cd Pb Sn Bi Fe Co Ni (Temperature/Condition) (11 00°C vac) (11 80°C vac) (15 60°C NH3) (11 30°C Ar) (850 to 10 00°C vac) (900°C Ar) (450°C... 9 Monday, April 25, 2005 12 :18 PM 34-9 Tribological Synergistic Coatings Taber Abrasion (Steel) mg 10 20 30 40 50 60 70 80 90 10 0 11 0 12 0 13 0 14 0 13 4.4 mg Electroless Nickel Per Mil-C-26074 Class 1 (0.0 01 — No Heat Treatment) 73.5 mg Electroless Nickel Per Mil-C-26074 Class 2 (0.0 01 — With Heat Treatment) 31 mg Nedox SF-2 − 0.0 01 (Gen Magnaplate Corp.) 27.7 mg Nedox CR + 0.0 01 (Gen Magnaplate Corp.)... Rc 80 to 85 Virtually no attack Virtually no attack Average weight loss >0.5 mg 1 to 3 µm 15 × 10 –5 0.000 015 in (max.) Body-centered cubic, a = 4.249 ô 5.44 g/cm4 ~0 .16 2 (at 15 00°C) ~0 .16 7 (at 16 00°C) ~0 .16 5 (at 17 00°C) ~0 .13 6 (at 2300°C) × 10 –6 cm/°C 9.35 ± 0.04 (at 25 ~11 00°C) 40 µΩ (at 27°C) 3.75 eV 2050 kg/mm2 (load 10 0 g) Note: Some alloys are sensitive to temperatures up to 900°F and can be reduced... Ar) (15 00°C vac) (15 50°C Ar) (15 50°C vac) (15 50°C vac) (14 50 to 15 00°C N2) TABLE 34.5 Static (S) and Kinetic (K) Coefficients of Friction for Variously Coated Components of a Panel Assembly Upper Panel Steel (4 to 8 µm in RMS) Steel (4–8 RMS) Magnagold (4–8 RMS) Teflon S: 0.534 ± 0.079 K: 0.400 ± 0.093 S: 0. 218 ± 0.028 K: 0 .19 4 ± 0.030 Lower Panel 0 .18 4 ± 0.029 0 .15 7 ± 0.029 0 .16 1 ± 0. 014 0 .11 4 ± 0. 017 ...DK4036_book.fm Page 8 Monday, April 25, 2005 12 :18 PM 34-8 Coatings Technology Handbook, Third Edition FIGURE 34.3 The Taber Abraser Taber Abrasion (Aluminum) mg 10 Weight Loss = mg Per 10 ,000 Cycles, CS -17 Wheel, 10 00 gm Load 20 30 40 50 60 42 mg Hardcoat Anodized (Sealed) Per MIL-A-8625 Type III, Class 1 19 mg Hardcoat Anodized (Unsealed) Per MIL-A-8625 Type III, Class 1 4 mg Magnaplate HCR Coating FIGURE... Travel Rotate Parts Are Rx Tured To Carrier Nitrogen DC Power Source Vacuum Titanium Hearth FIGURE 34.6 The Magnagold process sequence © 2006 by Taylor & Francis Group, LLC DK4036_book.fm Page 11 Monday, April 25, 2005 12 :18 PM Tribological Synergistic Coatings FIGURE 34.7 The Magnagold production setup © 2006 by Taylor & Francis Group, LLC 34 -11 DK4036_book.fm Page 1 Monday, April 25, 2005 12 :18 PM 35... Weight loss following Taber abrasion for steel samples with various coatings TABLE 34.3 Some Physical Properties of Magnagold Coatings Hardness Chemical resistance to 30% concentrations of nitric and sulfuric acids on copper and steel substrates at ambient temperature Alkali resistance Taber abrasion test, CS 10 wheel, 10 00 g load, 10 ,000 cycles Coating thickness Uniformity of thickness Crystal lattice... substrate 35 -1 © 2006 by Taylor & Francis Group, LLC DK4036_book.fm Page 4 Monday, April 25, 2005 12 :18 PM 35-4 Coatings Technology Handbook, Third Edition A B C FIGURE 35.2 Metallic compounds deposited by CVD (A) Iridium-coated rhenium thrust chamber for liquid rockets, 75 mm major diameter × 17 5 mm length × 0.75 mm wall thickness; (B) Tungsten crucible, 325 mm diameter × 575 mm height × 1. 5 mm wall... 34 -11 DK4036_book.fm Page 1 Monday, April 25, 2005 12 :18 PM 35 Chemical Vapor Deposition Deepak G Bhat GTE Valenite Corporation 35 .1 Introduction 35 -1 35.2 Process 35 -1 35.3 Applications .35-3 35.4 Summary 35-9 Bibliography .35 -10 35 .1 Introduction Chemical vapor deposition (CVD) is a technique of modifying properties of surfaces of engineering components by depositing... then the entire work cylinder enters the vacuum chamber A vacuum (1 × 10 –6 torr) is achieved, after which the system is purged with argon gas as an additional cleaning step Titanium metal (99.9%) is then vaporized by a plasma energy source This is followed by the precise introduction of nitrogen, the reactive gas, into the chamber The parts to be coated are cathodically charged by high voltage (dc), . 2 (load 10 0 g) 10 mg. 20 30 40 50 60 70 80 90 10 0 11 0 12 0 13 0 14 0 73.5 mg. 13 4.4 mg. 27.7 mg. 31 mg. Taber Abrasion (Steel) Electroless Nickel Per Mil-C-26074 Class 1 (0.0 01 — No Heat. Titanium P 0.2 91 0.240 Te flon Hard chromium 0. 210 0 .19 1 Te flon Magnagold + Ni 0.209 0 .16 0 Te flon Magnagold 0 .16 1 0 .11 4 Te flon Magnaplate HCR 0 .17 8 0 .16 7 Te flon Magnaplate HMF 0 .17 2 0 .15 4 Te flon. ° (11 80 ° C vac) 14 8 ° (15 60 ° C NH 3 ) 13 6 ° (11 30 ° C Ar) Al 14 7 ° (850 to 10 00 ° C vac) 13 5 ° (900 ° C Ar) Cd 13 9 ° (450 ° C vac) Pb 10 2

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