Lithography Part 15 pptx

[...]... G (1999) Low voltage electron beam lithography in PMMA J Vac Sci Technol B, 17 pp 1366-1370 570 Lithography Ocola, L E (2003) Soluble site density model for negative and positive chemically amplified resists J Vac Sci Technol B, 21 pp 156 -161 Ueno, H.; Hosaka, M.; Zhang, Y.; Tabata, O.; Konishi, S & Sugiyama, S (1997) Study on fabrication of high aspect ratio microparts using the LIGAprocess Proceedings... Dynamics Study on Mold and Pattern Breakages in Nanoimprint Lithography 555 6 Acknowledgement This work was partially supported by the New Energy and Industrial Technology Development Organization (NEDO) of Japan 7 References Akita, Y.; Watanabe, T.; Hara, W.; Matsuda, A & Yoshimoto, M (2007) Fine pattern fabrication on glass surface by imprint lithography, Jpn J Appl Phys., Vol 46, Nos 12-16, (April... (2003) Fine pattern fabrication on glass surface by imprint lithography, Microelectron Eng., Vols 67-68, (June 2003) pp 237-244 Hirai, Y.; Fujiwara, M.; Okuno, T.; Tanaka, Y.; Endo, M.; Irie, S.; Nakagawa, K & Sasago, M (2004) Study of the resist deformation in nanoimprint lithography, J Vac Sci Technol B, Vol 19, No 6, (Novemver 2001) pp 2811-2 815 Hirai, Y.; Konishi, T.; Yoshikawa, T & Yoshida, S (2004)... study of polymer deformation in nanoimprint lithography, J Vac Sci Technol B, Vol 22, No 6, (Novemver 2004) pp 3288-3293 Hua, F.; Sun, Y.; Gaur, A.; Meitl, M A.; Bilhaut, L.; Rotkina, L.; Wang, J.; Geil, P.; Shim, M.; Rogers, J A & Shim, A (2004) Polymer imprint lithography with molecular-scale resolution, Nano Lett., Vol 4, No 12, (December 2004) pp 2467-2471 556 Lithography Hua, F.; Gaur, A.; Sun, Y.;... Hirai, Y (2009a) Molecular dynamics study on mold fracture by nano scale defects in nanoimprint lithography, Proceedings of 25th European Mask and Lithography Conference, 32, Dresden, Germany, January 2009 Tada, K.; Kimoto, Y.; Yasuda, M.; Kawata, H & Hirai, Y (2009b) Molecular dynamics study of nanoimprint lithography for glass materials, Jpn J Appl Phys., Vol 48, No 6, (June 2009) 06FH13 Tada, K.;... thermal nanoimprint lithography, Jpn J Appl Phys., Vol 48, No 6, (June 2009) 06FH03 27 Three Dimensional Nanoimprint Lithography using Inorganic Electron Beam Resist Jun Taniguchi and Noriyuki Unno Tokyo University of Science Japan 1 Introduction With the advancement in the information technology the need for increasingly complex three-dimensional (3D) structure is eminent Gray scale lithography can produce... of the simulation is 300 K Figure 15 shows the cross-sectional views of the stress distributions in {110}/{100} mold during pressing The maximum stress is concentrated on the sidewall of the Si mold until whole the protruding portion of the mold is buried in the glass as shown in Figs 15 (a) and (b) Further pressing raises the stress inside the mold as shown in Fig 15 (c) Figure 16 shows the cross-sectional... Three-Dimensional Patterning using Ultraviolet Nanoimprint Lithography Maan M Alkaisi and Khairudin Mohamed MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Canterbury, Christchurch 8014, New Zealand 1 Introduction Although an extensive number of publications have been reported on nanoimprint lithography (NIL) techniques, the ability of... cost, high throughput and in addition is capable of 3-D patterning Its resolution is not limited by diffraction as in optical lithography or electron scattering as in electron beam lithography (EBL) and there is no expense that scales with reducing dimensions as in other nanolithography technologies The UV-NIL technique is especially useful in avoiding processes that require high pressure and high temperature... process for making the mold is achieved using a reactive ion etching (RIE) technique and subsequent imprint lithography is employed for the replication of the micro/nanostructures onto the daughter molds 572 Lithography The 3-D pattern profiles are created on a negative photoresist using a Raith 150 EBL tool in a single step variable e-beam dose controlled exposure Resist contrast curves are obtained . scale lithography can produce 3D structure but it cannot match the resolution of electron beam lithography (EBL). Today the EBL is primarily used for mask making and for making nanoimprint lithography. {110}/{100} mold than {110}/{110} mold (Tada et al., 2009a). (b) 15. 9 GPa -4.7 GPa (a) 13.1 GPa -4.5 GPa (b) (a) Lithography 548 Fig. 8. Stress-strain characteristics for (a). of the mold is buried in the glass as shown in Figs. 15 (a) and (b). Further pressing raises the stress inside the mold as shown in Fig. 15 (c). Figure 16 shows the cross-sectional views of