Bsi bs en 62047 22 2014

BS EN 62047-22:2014 BSI Standards Publication Semiconductor devices — Micro-electromechanical devices Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates BRITISH STANDARD BS EN 62047-22:2014 National foreword This British Standard is the UK implementation of EN 62047-22:2014 It is identical to IEC 62047-22:2014 The UK participation in its preparation was entrusted to Technical Committee EPL/47, Semiconductors A list of organizations represented on this committee can be obtained on request to its secretary This publication does not purport to include all the necessary provisions of a contract Users are responsible for its correct application © The British Standards Institution 2014 Published by BSI Standards Limited 2014 ISBN 978 580 77555 ICS 01.080.99 Compliance with a British Standard cannot confer immunity from legal obligations This British Standard was published under the authority of the Standards Policy and Strategy Committee on 31 October 2014 Amendments/corrigenda issued since publication Date Text affected EUROPEAN STANDARD EN 62047-22 NORME EUROPÉENNE EUROPÄISCHE NORM September 2014 ICS 01.080.99 English Version Semiconductor devices - Micro-electromechanical devices Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates (IEC 62047-22:2014) Dispositifs semiconducteurs - Dispositifs microélectromécaniques Partie 22: Méthode d'essai de traction électromécanique pour les couches minces conductrices sur des substrats souples (CEI 62047-22:2014) Halbleiterbauelemente - Bauelemente der Mikrosystemtechnik Teil 22: Elektromechanisches Zug-Prüfverfahren für leitfähige Dünnschichten auf flexiblen Substraten (IEC 62047-22:2014) This European Standard was approved by CENELEC on 2014-07-24 CENELEC members are bound to comply with the CEN/CENELEC Internal Regulations which stipulate the conditions for giving this European Standard the status of a national standard without any alteration Up-to-date lists and bibliographical references concerning such national standards may be obtained on application to the CEN-CENELEC Management Centre or to any CENELEC member This European Standard exists in three official versions (English, French, German) A version in any other language made by translation under the responsibility of a CENELEC member into its own language and notified to the CEN-CENELEC Management Centre has the same status as the official versions CENELEC members are the national electrotechnical committees of Austria, Belgium, Bulgaria, Croatia, Cyprus, the Czech Republic, Denmark, Estonia, Finland, Former Yugoslav Republic of Macedonia, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, the Netherlands, Norway, Poland, Portugal, Romania, Slovakia, Slovenia, Spain, Sweden, Switzerland, Turkey and the United Kingdom European Committee for Electrotechnical Standardization Comité Européen de Normalisation Electrotechnique Europäisches Komitee für Elektrotechnische Normung CEN-CENELEC Management Centre: Avenue Marnix 17, B-1000 Brussels © 2014 CENELEC All rights of exploitation in any form and by any means reserved worldwide for CENELEC Members Ref No EN 62047-22:2014 E BS EN 62047-22:2014 EN 62047-22:2014 -2- Foreword The text of document 47F/186/FDIS, future edition of IEC 62047-22, prepared by SC 47F “Microelectromechanical systems” of IEC/TC 47 “Semiconductor devices" was submitted to the IEC-CENELEC parallel vote and approved by CENELEC as EN 62047-22:2014 The following dates are fixed: • latest date by which the document has to be implemented at national level by publication of an identical national standard or by endorsement (dop) 2015-04-24 • latest date by which the national standards conflicting with the document have to be withdrawn (dow) 2017-07-24 Attention is drawn to the possibility that some of the elements of this document may be the subject of patent rights CENELEC [and/or CEN] shall not be held responsible for identifying any or all such patent rights Endorsement notice The text of the International Standard IEC 62047-22:2014 was approved by CENELEC as a European Standard without any modification BS EN 62047-22:2014 EN 62047-22:2014 -3- Annex ZA (normative) Normative references to international publications with their corresponding European publications The following documents, in whole or in part, are normatively referenced in this document and are indispensable for its application For dated references, only the edition cited applies For undated references, the latest edition of the referenced document (including any amendments) applies NOTE When an International Publication has been modified by common modifications, indicated by (mod), the relevant EN/HD applies NOTE Up-to-date information on the latest versions of the European Standards listed in this annex is available here: www.cenelec.eu Publication Year Title EN/HD Year IEC 62047-2 2006 Semiconductor devices - Microelectromechanical devices Part 2: Tensile testing method of thin film materials EN 62047-2 2006 IEC 62047-3 2006 Semiconductor devices - Microelectromechanical devices Part 3: Thin film standard test piece for tensile testing EN 62047-3 2006 IEC 62047-8 2011 Semiconductor devices - Microelectromechanical devices Part 8: Strip bending test method for tensile property measurement of thin films EN 62047-8 2011 ISO 527-3 1995 Plastics - Determination of tensile properties Part-3: Test conditions for films and sheets EN ISO 527-3 1995 –2– BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 CONTENTS Scope Normative references Terms, definitions, symbols and designations 3.1 Terms and definitions 3.2 Symbols and designations Test piece 4.1 General 4.2 Shape of a test piece 4.3 Measurement of dimensions Testing method and test apparatus 5.1 5.2 5.3 5.4 Test Test principle Test machine Test procedure Test environment report Figure – Bilayered test piece Figure – Schematic of an electromechanical test machine Figure – Electromechanical tensile grip Table – Symbols and designations of a test piece BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 –5– SEMICONDUCTOR DEVICES – MICRO-ELECTROMECHANICAL DEVICES – Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates Scope This part of IEC 62047 specifies a tensile test method to measure electromechanical properties of conductive thin micro-electromechanical systems (MEMS) materials bonded on non-conductive flexible substrates Conductive thin-film structures on flexible substrates are extensively utilized in MEMS, consumer products, and flexible electronics The electrical behaviours of films on flexible substrates differ from those of freestanding films and substrates due to their interfacial interactions Different combinations of flexible substrates and thin films often lead to various influences on the test results depending on the test conditions and the interfacial adhesion The desired thickness of a thin MEMS material is 50 times thinner than that of the flexible substrate, whereas all other dimensions are similar to each other Normative references The following documents, in whole or in part, are normatively referenced in this document and are indispensable for its application For dated references, only the edition cited applies For undated references, the latest edition of the referenced document (including any amendments) applies IEC 62047-2:2006, Semiconductor devices – Micro-electromechanical devices – Part 2: Tensile testing method of thin film materials IEC 62047-3:2006, Semiconductor devices – Micro-electromechanical devices – Part 3: Thin film standard test piece for tensile testing IEC 62047-8:2011, Semiconductor devices – Micro-electromechanical devices – Part 8: Strip bending test method for tensile property measurement of thin films ISO 527-3:1995, Plastics – Determination of tensile properties – Part 3: Test conditions for films and sheets 3.1 Terms, definitions, symbols and designations Terms and definitions For the purposes of this document, the following terms and definitions apply 3.1.1 gauge factor GF ratio of the change in electrical resistance divided by the original resistance (R o , resistance in the undeformed configuration) to engineering strain (e) Note to entry: Gauge factor is expressed as G F = (R – R O )/R O e, where R is the electrical resistance in the deformed configuration BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 –6– 3.1.2 elongation at electrical failure A telic engineering strain value at which the electrical resistance starts to exceed a predefined limit 3.2 Symbols and designations h1 l2 h2 The shape of the test piece and symbols are presented in Figure and Table 1, respectively The overall shape of the test piece is similar to a conventional thin-film or sheet test piece (in accordance with ISO 527-3) for tensile tests, but it has a multilayered structure l1 b IEC 1841/14 Figure – Bilayered test piece Table – Symbols and designations of a test piece 4.1 Symbol Unit Designation l1 µm Gauge length for strain and resistance change measurements l2 µm Overall length h1 µm Thickness of the first layer (or thin film) h2 µm Thickness of the second layer (or substrate) b µm Width Test piece General The test piece shall be prepared using the same fabrication process as the actual device fabricated for flexible MEMS Machining of the test piece shall be performed carefully to prevent formation of cracks or flaws and delamination in the test piece Chemical etching or mechanical machining with a very sharp tool shall be applied to shape the test piece 4.2 Shape of a test piece The shape of a test piece is shown in Figure Because the change in electrical resistance is related to strain or stress, electrical resistance shall be measured in a region of nearly uniform strain To measure electrical resistance, attach lead wires to the conductive thin film of the test piece Conductive thin films deposited on flexible substrates are usually very thin compared with the diameter of the lead wires, and the lead wires are easily detached from the test piece during the electromechanical test Therefore, place the lead wires in tensile grips and secure the electrical contact by applying mechanical contact force Tensile grips are described in detail in 5.2 For uniform strain distribution, the shape of the test piece is a rectangular strip, not a dog bone (see Figure of ISO 527-3:1995 for other rectangular test pieces) To eliminate the effect of the fixed boundary near the grips (l ), the gauge length shall be at least 20 times larger than the width (b) BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 4.3 –7– Measurement of dimensions To analyze the test results, the test piece dimensions shall be accurately measured because the dimensions are used to determine the mechanical properties of test materials Gauge length (l ), width (b), and thickness (h , h ) should be measured with an error of less than ± % Thickness measurement shall be performed according to Annex C of IEC 620472:2006 and to Clause of IEC 62047-3:2006 There can be some combinations of thin film and substrate where it is difficult to fulfil the tolerance of thickness measurement In this case the average and the standard deviation of the thickness measurement should be reported 5.1 Testing method and test apparatus Test principle The test is performed by applying a tensile load to a test piece The tensile strain induced by the tensile load shall be uniform in a pre-defined gauge section in the elastic region of the substrate or the thin MEMS material To measure the change in electrical resistance along with the change in mechanical strain, carefully select the gauge section The gauge section for measuring mechanical strain shall be coincident with or scalable to that for measuring electrical resistance This constraint is an important point in this standard 5.2 Test machine The test machine is similar to a conventional tensile test machine except that it is capable of measuring electrical resistance during the test The electrical measurement circuit can be a 2wire or 4-wire method depending on the magnitude of the electrical resistance of the test piece For a test piece with an electrical resistance greater than kΩ, a 2-wire method can be utilized for ease of measurement For a test piece with an electrical resistance less than kΩ, the 4-wire method (Kelvin method) shall be utilized to eliminate contact and lead wire resistance A schematic of the test machine is shown in Figure 2a) For a material sensitive to stress concentration and local plastic deformation, a test piece with rounded, gripped ends shall be used according to Figure of IEC 62047-2:2006, and the test machine in Figure 2b) should be used BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 –8– IEC a) Test machine setup using grips with an electrical contact IEC b) 1842/14 1843/14 Test machine setup using electrical contacts on the test piece Key Machine frame Grip Loadcell Actuator Volt meter Specimen Figure – Schematic of an electromechanical test machine To measure electrical resistance, a tensile grip with electrical contacts is utilized, and the number of electrical contacts is dependent on the electrical measurement method (2-wire or 4-wire method) A schematic of the tensile grip is shown in Figure In this standard, strain is estimated from the grip-to-grip distance An optical or mechanical extensometer shall be used to measure the grip-to-grip distance BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 –9– IEC 1844/14 IEC a) Photograph of the installed tensile grip 1845/14 b) Schematic of the tensile grip Key Probe pin Bolt Insulating jig Specimen Figure – Electromechanical tensile grip 5.3 Test procedure The test procedure is as follows: a) Fix the test piece using the test apparatus tensile grip The longitudinal direction of the test piece shall be aligned with the actuating direction of the test apparatus, and the deviation angle shall be less than degree, as specified in 4.4 of IEC 62047-8:2011 b) Verify the electrical measurement unit as well as the loadcell and strain measurement unit The three signals provided by the measurement units shall be measured simultaneously with no time delay c) Apply a tensile load to the test piece at a constant strain rate (or grip-to-grip displacement rate) The strain rate shall range from 0,01 –1 to 10 –1 depending on the material system of the test piece and the actual usage condition of the customer d) Unload the test apparatus when electrical failure occurs in the test piece After testing, carefully remove the test piece from the test apparatus to analyze its failure mechanism If possible, preserve the fractured test piece after testing 5.4 Test environment Because electrical properties are temperature sensitive, fluctuations in temperature during the test shall be controlled to be less than ± °C Flexible substrates made of certain polymeric materials can be sensitive to humidity; thus, the change in relative humidity (RH) in the testing laboratory shall be controlled to be less than ± % RH for such materials Test report The test report shall contain the following information a) Reference to this international standard; b) Test piece identification number; c) Test piece preparation procedures; d) Multilayered structure of the test piece; e) Test piece dimensions and their measurement method; f) Description of the testing apparatus; – 10 – BS EN 62047-22:2014 IEC 62047-22:2014 © IEC 2014 g) Measured properties and results: elongation at electrical failure, gauge factor in the linear domain, change in electrical resistance versus strain curve, composite stress versus strain curve; h) Failure mechanism of the test piece _ This page deliberately left blank NO COPYING WITHOUT BSI PERMISSION EXCEPT AS PERMITTED BY COPYRIGHT LAW British Standards Institution (BSI) BSI is the national 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