Polymer electronic memories materials, devices mechanisms

Polymer electronic memories  materials, devices  mechanisms

Polymer electronic memories materials, devices mechanisms

... memory devices based on conformation change, while still maintaining significant ON/OFF current ratios 22 Chapter Chapter Literature Review 2.1 Polymer Electronic Memories Polymer electronic memories ... single-layer devices based on two non-conjugated polymers While 19 Chapter non-rewritable memory effects were observed for both polymer devices, the volatilities of the po...

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Nanotechnology and Nanoelectronics Materials, Devices, Measurement Techniques ppt

Nanotechnology and Nanoelectronics Materials, Devices, Measurement Techniques ppt

... W R Fahrner (Editor) Nanotechnology and Nanoelectronics Materials, Devices, Measurement Techniques With 218 Figures 4y Springer Prof Dr W R Fahrner University ... not restricted to nanoelectronics alone but can also be valid for materials, methods, and systems There are schools and institutions which are engaged in predictions of how nanotechnology will ... 5.2.1 Optic...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 14 pdf

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 14 pdf

... 96, 97 band gap – diamond – GaAlAs 14 – GaAs 14, 214 – silicon 8, 10 – Sin clusters band gap engineering 139, 183, 219 beam deflection, electrostatic 180 bending band 114 beveling 93, 143 , 147 BF2 ... production 39 nanoparticle 107, 135 – applications 117 – characterization 114 – Co nanoparticle 228 – fabrication 107 – GaN 114 nanopolishing of diamond 143 – characterization 144 na...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 2 pot

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 2 pot

... special case of the Shockley-Hall-Read generation recom- Fig 3.5 Raman shift of H2 bonds (a) and of Si-H bonds (b) [22 ] 3 .2 Characterization of Nanodefects in Crystals 21 bination statistics: q ... Czochralski (Cz) Si is plasma-treated for 120 at 25 0 °C and annealed in air for 10 at temperatures between 25 0 °C and 600 °C The Raman shift is measured in two spectral regions [22 ,...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 3 pdf

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 3 pdf

... homo-pin or epitaxial heterojunction structures A typical EL spectrum can be seen in Fig 3. 25 Fig 3. 23 Electroluminescence of an implanted MOS oxide [33 ] 3. 4 Nuclear Track Nanodefects 35 Fig 3. 24 ... E = 30 0 keV, light-gray symbols: 1·1015, 1·1016, and 1·1017 cm helium dose, E = MeV The concentrations were determined by secondary ion mass spectroscopy [32 ] 34 Nanodefects 3....

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 5 doc

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 5 doc

... 10 19 10 10 [H] 18 10 [O] 0.0 0 .5 1.0 1 .5 2.0 2 .5 18 3.0 [O] 17 10 Depth, µm 20 1.0 1 .5 2.0 2 .5 3.0 20 120 1000 °C / H2 Concentration, cm-3 Concentration, cm-3 0 .5 10 19 240 1000 °C / H2 19 10 ... [O] 18 10 [H] [O] 18 10 17 17 0 .5 1.0 1 .5 2.0 Depth, µm Fig 4 .52 0.0 Depth, µm 10 100.0 [H] 10 17 10 19 2 .5 3.0 10 0.0 0 .5 1.0 1 .5 2.0 2 .5 3.0 Depth, µm Hydrogen and oxyge...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 8 pptx

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 8 pptx

... one or quasi-one-dimensional electrical conducting structures (1D nanowires) metal-loaded zeolites with suitable channel structures are suggested as promising candidates [1 68, 186 , 187 ] Thus, the ... number, cm-1 (a) 1·10 Intensity, arb units 1·10 1·10 9·10 8 10 7·10 6·10 1000 1200 1400 1600 180 0 -1 Wave number, cm 1 .8 104 Intensity, arb units 1.6·10 1331 (b) 1 580 1.4·104 1353 14 78...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 9 doc

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 9 doc

... irregularities and the focus position, holds: DOF k2 NA (7.2) k1 and k2 are pre-factors which take into account both the entrance opening of the lenses and the coherency degree of the light, and the ... by multi-layer systems with thin radiation-sensitive surface films Beside the already currently wide-spread anti-reflection layers as top or bottom coatings for sensitivity optimizatio...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 10 pptx

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 10 pptx

... Dimming and deflecting voltages can range from some 10 to some 100 V and must be available as a wide-band (MHz to GHz) in order to achieve high dose accuracies and writing rates Navigation and Joining ... 29 °C and therefore requires practically no heating Heating to about 600 °C for some 10 seconds is necessary for moistening and remoistening of the metal needle in intervals...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 11 ppt

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 11 ppt

... Fig 7.46 Measurement of a single 1,1'-dioctadecyl-3,3,3',3'-tetramethylindocarbocyanin molecule with a near-field probe (a) Measurement setup, (b) fluorescence image 7.7.2 Evaluation and Future ... the one hand On the other hand, the germanium doping causes a modification of the band structure and enables an ex- Fig 8.10 Cross section of a bipolar transistor, manufactured in self-adju...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 12 docx

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 12 docx

... 9.2 Conduction band diagram and current-voltage characteristics at 77 and 300 K of an AlAs/InGaAs RTD (from [304]) characteristics suggest both bistable and astable applications, and, indeed, the ... technologies (from [319]) Logical function bistable XOR 9-state memory NOR2 + flip-flop NAND2 + flip-flop TTL 33 24 14 14 CMOS 16 24 12 12 ECL 11 24 33 33 RTD 4 218 Innovative Electronic...

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Silicon Carbide Materials Processing and Applications in Electronic Devices Part 1 docx

Silicon Carbide Materials Processing and Applications in Electronic Devices Part 1 docx

... 0 .13 3 0.24 0.39 0.422 0.54 0.7 10 0 99.9 99.5 98.4 96 .1 96.3 96.2 94.2 10 0 99.6 98.9 97.8 95 .1 92 .1 84 .1 83.5 N 1. 662 1. 6 61 1.648 1. 646 1. 635 1. 610 1. 585 1. 896 1. 862 1. 867 1. 872 1. 877 1. 880 1. 885 ... 16 Silicon Carbide – Materials, Processing and Applications in Electronic Devices Fig 10 (11 0) projections of indentation damages in...

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Silicon Carbide Materials Processing and Applications in Electronic Devices Part 2 pot

Silicon Carbide Materials Processing and Applications in Electronic Devices Part 2 pot

... (Si) 2/ 3 (C) 2/ 3 y 3/4 0 2/ 3 2/ 3 1/3 1/3 2/ 3 2/ 3 0 2/ 3 2/ 3 0 2/ 3 2/ 3 1/3 1/3 z Wyckoff 4a 3/4 4d 2a 1/4 2a 1/3 2b 7/ 12 2b 2/ 3 2b 11/ 12 2b 2b 3/8 2b 2a 3/16 2a 1/4 2b 7/16 2b 2a 1/8 2a 1/6 2b 7 /24 ... optimized 2. 10 -0.54 cage-bowl-ring a MP2/TZV2d1f HF/6-31G∗ 2. 61 0.69 bowl-cage-ring a MR-MP2/TZV2d MP2/TZV2d1f 2. 42 -0. 02 cage-bowl-ring a MR-MP2/TZV2d1f MP2/...

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Silicon Carbide Materials Processing and Applications in Electronic Devices Part 3 pdf

Silicon Carbide Materials Processing and Applications in Electronic Devices Part 3 pdf

... 2010) Photoluminescence spectrum from the front surface of the nanocrystalline film 70 Silicon Carbide – Materials, Processing and Applications in Electronic Devices containing cubic 3C and rhombohedral ... 0.297 0.099 0. 030 0 .33 0 0.264 0.165 0.099 0. 033 0.010 0. 230 0.184 0.115 0.069 0.0 23 0.007 120.4 60.0 30 .3 16.1 10.5 46.0 28 .3 16.9 10.2 7.2 93. 0 47.0 24.0 1...

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