Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 9 doc

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 9 doc

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 9 doc

... previous line widths. X-ray lithography may be a solu- tion for structure widths between 70 and 40 nm. Presumably, finer structures can- not be imaged. 7.3.7 Evaluation and Future Prospects The ... the wafer sur- face. Thus, by diffraction or interference effects resolution improvements in cor- ners, on points, and particularly with isolated lines can be obtained. The distribu- tion o...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 5 doc

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 5 doc

... falsify the measurement. In some cases (e.g., when measuring an inhomogeneous doping process), one has to give up the advantages of the four-probe measurement, and the two-probe measurement ... the feed current and the applied voltage are meas- ured in only one pair of points. A correction factor between V / I and U is also needed. The pros and cons of the two-point measurem...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 12 docx

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 12 docx

... nipi SL (Fabry-Perot) 8.8 Page et al. [338] ( 199 9) GaAs/AlGaAs MQW (Fabry-Perot) pulsed >1 W (77 K) 9. 7 Hofstetter et al. [3 39] ( 199 9) GaInAs/AlInAs MQW (DFB) pulsed 80 mW (300 K) ... plasma at 90 0 °C. To give an idea of the dimensions of the device: the lengths of the white marks are 50 µm in Fig. 9. 19g and 2 µm in Fig. 9. 19h. Fig. 9. 18 Structure and electr...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 14 pdf

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 14 pdf

... vol 294 , p 1317 397 . Hu J, Ouyang M, Yang P, Lieber CM ( 199 9) Controlled growth and electrical pro- perties of heterojunctions of carbon nanotubes and silicon nanowires. Nature, vol 399 , p ... 5–8, 199 3, p 705 296 . Asenov A ( 199 8) Random Dopant Threshold Voltage Fluctuations in 50 nm Epi- taxial Channel MOSFETs: A 3D “Atomistic” Simulation Study. ESSDERC 98 , Sep 8–10, 199...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 2 pot

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 2 pot

... effort. Un- fortunately, an in-depth discussion is beyond the scope of this book. Conse- quently, the interested reader is kindly referred to literature references such as [18] and [ 19] and quotations ... rate g, and like derived from the Shockley-Hall-Read statistics, a measure for the local density of the traps: Fig. 3.7 IR absorption spectra for neutral thermal donors (a) and si...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 3 pdf

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 3 pdf

... the active layer, e.g., n-type on p-type substrate, silicon-on-sapphire (SOS), and silicon-on- oxide (SOI). The latter includes versions like (i) oxygen implantation and SiO 2 formation, (ii) ... It has been a long-nourished hope to develop opto-elec- tronic components by means of standard silicon technology. However, silicon is not suitable because of its indirect band gap. Therefore,...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 8 pptx

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 8 pptx

... con- ductive channels from each other and hence really ensuring a quasi-one-dimen- sional current conduction is difficult. Besides, the zeolite material loaded with potassium is very reactive and ... production of one or quasi-one-dimensional electrical conduct- ing structures (1D nanowires) metal-loaded zeolites with suitable channel struc- tures are suggested as promising candidates [1...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 10 pptx

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 10 pptx

... remain depleted be- tween the p and n regions. Therefore, a p-type line in a n-type area (e.g., a two- dimensional electron gas; 2DEG) works like two lateral anti-serial switched di- odes. Thus, ... Dimming and de- flecting voltages can range from some 10 to some 100 V and must be available as a wide-band (MHz to GHz) in order to achieve high dose accuracies and writing rates. Navig...

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Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 11 ppt

Nanotechnology and Nanoelectronics - Materials, Devices, Measurement Techniques Part 11 ppt

... the STM 198 7 Nanostructuring (a) (b) Fig. 7.46 Measurement of a single 1,1'-dioctadecyl-3,3,3',3'-tetramethylindocarbocyanin molecule with a near-field probe. (a) Measurement ... the one hand. On the other hand, the ger- manium doping causes a modification of the band structure and enables an ex- Fig. 8.10 Cross section of a bipolar transistor, manufactured in self-...

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